Presentation
30 April 2023 Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning
Author Affiliations +
Abstract
Infiltration synthesis of vapor-phase precursors is ex-situ route of converting established polymeric resists into hybrids. The concept initially modelled over polymethylmethacrylate (PMMA)-AlOx hybrid has been expanded to infiltrating several metal oxide moieties into high sensitivity resist (HSR). Beyond implementing single metal oxide species, alloyed infiltration is explored as a means to limit pattern roughness originating from granular crystallites. Lithography performance of these new generation of hybrid positive tone resists is assessed towards contact-hole patterning.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nikhil M. Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, and Chang-Yong Nam "Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124981A (30 April 2023); https://doi.org/10.1117/12.2658659
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KEYWORDS
Optical lithography

Metals

Oxides

Extreme ultraviolet

Extreme ultraviolet lithography

Lithography

Materials processing

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