PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Infiltration synthesis of vapor-phase precursors is ex-situ route of converting established polymeric resists into hybrids. The concept initially modelled over polymethylmethacrylate (PMMA)-AlOx hybrid has been expanded to infiltrating several metal oxide moieties into high sensitivity resist (HSR). Beyond implementing single metal oxide species, alloyed infiltration is explored as a means to limit pattern roughness originating from granular crystallites. Lithography performance of these new generation of hybrid positive tone resists is assessed towards contact-hole patterning.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Nikhil M. Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam, "Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning," Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 124981A (30 April 2023); https://doi.org/10.1117/12.2658659