Dr. Chang-Yong Nam Profile

Dr. Chang-Yong Nam

Scientist at Brookhaven National Lab

SPIE Involvement:

Author

Area of Expertise:

Nanostructured semiconductor , Electrical transport measurement , Organic solar cells , Energy conversion devices , Nanofabrication , Semiconductor nanowires

Websites:

Company Website

Profile Summary

Dr. Chang-Yong Nam
Center for Functional Nanomaterials
Brookhaven National Laboratory
Upton, New York 11973
Tel: 631-344-7066
E-mail: cynam@bnl.gov

Web: www.bnl.gov/cfn
LinkedIn: http://www.linkedin.com/in/cynam
Blogger: http://energybnl.blogspot.com/

PROFESSIONAL APPOINTMENT:
Scientist, BNL, 2016-Present
Adjunct Professor, Dept. Materials Science and Chemical Engineering, Stony Brook Univ., 2014-Present
Associate Scientist, BNL, 2013-2016
Assistant Scientist, BNL, 2010-2013
Goldhaber Distinguished Fellow, BNL, 2007-2010
Commissioned Researcher, Korea Inst. Sci. & Tech. (KIST), 2001-2002

EDUCATION:
Ph.D., Materials Science and Engineering, University of Pennsylvania, 2007
M.S., Materials Science and Engineering, KAIST, 2001
B.E., Metallurgical Engineering, Korea University, 1999

BIOGRAPHY:
Chang-Yong Nam is a Scientist at the Center for Functional Nanomaterials of the Brookhaven National Laboratory (BNL). His research is focused on two primary objectives: a) Development of atomic layer deposition (ALD) techniques towards microelectronics and energy application; b) Materials processing and device physics in organic, hybrid, and low-dimensional semiconductors.

Publications (15)

Proceedings Article | 12 November 2024 Poster + Paper

Poster + Paper

Inspection of next generation EUV resists with nano-projectile SIMS

Gregrey Swieca, Won-II Lee, Shixian Ha, Nikhil Tiwale, Chang-Yong Nam, Michael Eller

Proceedings Volume 13215, 132151B (2024) https://doi.org/10.1117/12.3037084

KEYWORDS: Ions, Polymethylmethacrylate, Indium, Indium oxide, Extreme ultraviolet, Extreme ultraviolet lithography, Statistical analysis, Inspection, Mass spectrometry, Nanodomains, Nanoprobes

Read Abstract +

Proceedings Article | 10 April 2024 Presentation

Presentation

Vapor-phase infiltration (VPI) / sequential infiltration synthesis (SIS) for advanced patterning applications

Chang-Yong Nam

Proceedings Volume PC12956, PC129560U (2024) https://doi.org/10.1117/12.3010072

KEYWORDS: Advanced patterning, Optical lithography, Photoresist materials, Metal oxides, Block copolymers, Polymers, Nanostructures, Matrices, Materials properties, Extreme ultraviolet lithography

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Proceedings Article | 9 April 2024 Presentation + Paper

Presentation + Paper

Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications

Dan Le, Thi Thu Huong Chu, Jin-Hyun Kim, Jean-Francois Veyan, Won-Il Lee, Nikhil Tiwale, Minjong Lee, Seungsoo Choi, Jihoon Woo, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12957, 129570B (2024) https://doi.org/10.1117/12.3010970

KEYWORDS: Thin films, Film thickness, X-ray photoelectron spectroscopy, Atomic layer deposition, Chemical analysis, Aluminum, Carbon monoxide, Materials science, Extreme ultraviolet lithography, Engineering

Read Abstract +

Proceedings Article | 30 April 2023 Presentation

Presentation

Atomic layer deposition derived organic-inorganic hybrid EUV photoresists

Ashwanth Subramanian, Dan Le, Su Min Hwang, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

Read Abstract +

Proceedings Article | 30 April 2023 Presentation

Presentation

Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning

Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 124981A (2023) https://doi.org/10.1117/12.2658659

KEYWORDS: Optical lithography, Oxides, Metals, Polymer thin films, Nanolithography, Nanocomposites, Materials processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet

Read Abstract +

Proceedings Article | 1 December 2022 Presentation + Paper

Presentation + Paper

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647

KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

Read Abstract +

Proceedings Article | 11 November 2022 Presentation

Presentation

EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration

Ashwanth Subramanian, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920L (2022) https://doi.org/10.1117/12.2643226

KEYWORDS: Extreme ultraviolet lithography, Polymethylmethacrylate, Photoresist materials, Silicon, Resistance, Indium oxide, Etching, Electron beam lithography, Dry etching, Plasma

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Proceedings Article | 11 November 2022 Presentation

Presentation

Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition

Won-Il Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan Le, Su Min Hwang, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794

KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons

Read Abstract +

Proceedings Article | 13 June 2022 Presentation

Presentation

Infiltration synthesis: paving way for uniquely functional hybrids and direct-writing optoelectronic nanostructures

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Aaron Stein, Chang-Yong Nam

Proceedings Volume PC12054, PC120540G (2022) https://doi.org/10.1117/12.2618064

KEYWORDS: Nanostructures, Optoelectronics, Thin films, Thin film devices, Polymers, Polymer thin films, Photoresist materials, Oxides, Optoelectronic devices, Microelectromechanical systems

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Proceedings Article | 30 September 2021 Poster + Presentation

Poster + Presentation

Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications

Su Min Hwang, Aditya Raja Gummadavelly, Dan Le, Yong Chan Jung, Jean-Francois Veyan, Nikhill Tiwale, Chang-Yong Nam, Jinho Ahn, Jiyoung Kim

Proceedings Volume 11854, 118541C (2021) https://doi.org/10.1117/12.2601033

KEYWORDS: Extreme ultraviolet, Metals, Atomic layer deposition, Polymethylmethacrylate, Photoresist processing, FT-IR spectroscopy, Extreme ultraviolet lithography, Silicon, Resistance, Printed circuit board testing

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Hybrid resist synthesis by ex-situ vapor-phase infiltration of metal oxides into conventional organic resists

Nikhil Tiwale, Ashwanth Subramanian, Guillaume Freychet, Eliot Gann, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 11612, 116120A (2021) https://doi.org/10.1117/12.2583908

KEYWORDS: Etching, Oxides, Metals, Extreme ultraviolet, Resistance, Optical lithography, Silicon, Scanning transmission electron microscopy, Plasma etching, Nanolithography

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Infiltration synthesis of hybrid nanocomposite resists for advanced nanolithography

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Jiyoung Kim, Aaron Stein, Chang-Yong Nam

Proceedings Volume 11326, 113260J (2020) https://doi.org/10.1117/12.2552164

KEYWORDS: Etching, Electron beam lithography, Extreme ultraviolet lithography, Polymethylmethacrylate, Atomic layer deposition

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Proceedings Article | 14 May 2018 Presentation

Presentation

Application of quantum dot sensitization on two-dimensional semiconductors for improved light harvesting (Conference Presentation)

Chang-Yong Nam

Proceedings Volume 10639, 106390W (2018) https://doi.org/10.1117/12.2304741

KEYWORDS: Semiconductors, Quantum dots, Light harvesting, Photodetectors, Optoelectronic devices, Absorption, Electronic components, Photovoltaics, Solar cells, Transistors

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SPIE Journal Paper | 14 March 2012

Implementing nanometer-scale confinement in organic semiconductor bulk heterojunction solar cells

Jonathan Allen, Kevin Yager, Chang-Yong Nam, Charles Black, Htay Hlaing, Benjamin Ocko

JPE, Vol. 2, Issue 1, 021008, (March 2012) https://doi.org/10.1117/12.10.1117/1.JPE.2.021008

KEYWORDS: Solar cells, Heterojunctions, Organic semiconductors, Annealing, Aluminum, Scattering, Organic photovoltaics, Polymethylmethacrylate, Scanning electron microscopy, Etching

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Proceedings Article | 19 October 2006 Paper

Paper

Gallium nitride nanowires: polar surface controlled growth, ohmic contact patterning by focused ion-beam-induced direct Pt deposition and disorder effects, variable range hopping, and resonant electromechanical properties

Chang-Yong Nam, Douglas Tham, Papot Jaroenapibal, Jinyong Kim, David Luzzi, Stephane Evoy, John Fischer

Proceedings Volume 6370, 63701F (2006) https://doi.org/10.1117/12.690902

KEYWORDS: Gallium nitride, Gallium, Transmission electron microscopy, Platinum, Silicon, Metals, Crystals, Scanning electron microscopy, Ion beams, Diffusion

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Showing 5 of 15 publications

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