Dr. Bo Mu Profile

Dr. Bo Mu

at OmniVision Technologies Inc

SPIE Involvement:

Author

Proceedings Article | 25 September 2010 Paper

28N foundry reticle requal challenges and solutions for IC fabs

Mike Yeh, David Wu, Bo Mu, Bryan Reese

Proceedings Volume 7823, 782338 (2010) https://doi.org/10.1117/12.867258

KEYWORDS: Inspection, Reticles, SRAF, Photomasks, Air contamination, Semiconducting wafers, Contamination, Metals, Defect detection, Wafer inspection

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Proceedings Article | 20 March 2010 Paper

Assessing EUV mask defectivity

Uzodinma Okoroanyanwu, Anna Tchikoulaeva, Paul Ackmann, Obert Wood, Bruno La Fontaine, Karsten Bubke, Christian Holfeld, Jan Hendrik Peters, Sumanth Kini, Sterling Watson, Isaac Lee, Bo Mu, Phillip Lim, Sudhar Raghunathan, Carol Boye

Proceedings Volume 7636, 76360J (2010) https://doi.org/10.1117/12.847348

KEYWORDS: Reticles, Inspection, Photomasks, Semiconducting wafers, Extreme ultraviolet, Defect detection, Line edge roughness, Scanning electron microscopy, Defect inspection, Optical lithography

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Proceedings Article | 23 September 2009 Paper

SMO photomask inspection in the lithographic plane

Emily Gallagher, Karen Badger, Yutaka Kodera, Jaione Tirapu Azpiroz, Ioana Graur, Scott Halle, Kafai Lai, Gregory McIntyre, Mark Wihl, Shaoyun Chen, Ge Cong, Bo Mu, Zhian Guo, Aditya Dayal

Proceedings Volume 7488, 748807 (2009) https://doi.org/10.1117/12.830668

KEYWORDS: Photomasks, Inspection, Source mask optimization, Semiconducting wafers, Lithography, Manufacturing, Binary data, Reticles, Image processing, Image resolution

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Proceedings Article | 11 May 2009 Paper

TeraScanXR: a high sensitivity and throughput photomask inspection system

Bo Mu, Aditya Dayal, Arosha Goonesekera, Phillip Lim, Chunlin Chen, Po Liu, Kevin Yeung, Becky Pinto, Bill Broadbent, Gregg Inderhees

Proceedings Volume 7379, 73792B (2009) https://doi.org/10.1117/12.824325

KEYWORDS: Inspection, Reticles, Sensors, Databases, Photomasks, Detection and tracking algorithms, SRAF, Logic, Imaging systems, Critical dimension metrology

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Proceedings Article | 24 March 2009 Paper

Results from prototype die-to-database reticle inspection system

Bo Mu, Aditya Dayal, Bill Broadbent, Phillip Lim, Arosha Goonesekera, Chunlin Chen, Kevin Yeung, Becky Pinto

Proceedings Volume 7272, 72723O (2009) https://doi.org/10.1117/12.815574

KEYWORDS: Prototyping, Inspection, Reticles, Sensors, Detection and tracking algorithms, Imaging systems, Logic, SRAF, Signal to noise ratio, Digital breast tomosynthesis

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Proceedings Article | 17 October 2008 Paper

Results from the KLA-Tencor TeraScanXR reticle inspection tool

Aditya Dayal, Bo Mu, Venkat Iyer, Phillip Lim, Arosha Goonesekera, Bill Broadbent

Proceedings Volume 7122, 71223G (2008) https://doi.org/10.1117/12.801831

KEYWORDS: Inspection, Reticles, Line edge roughness, Signal to noise ratio, Sensors, Detection and tracking algorithms, Spatial frequencies, Modulation transfer functions, Image processing, Defect detection

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Proceedings Article | 19 May 2008 Paper

Thin-line de-sense capability for database mode inspections with KLA-Tencor TeraScanHR

Arosha Goonesekera, Isaac Lee, Bo Mu, Aditya Dayal

Proceedings Volume 7028, 70282J (2008) https://doi.org/10.1117/12.793089

KEYWORDS: SRAF, Inspection, Databases, Reticles, Photomasks, Optical proximity correction, Sensors, Resolution enhancement technologies, Photoresist materials, Lithography

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Proceedings Article | 24 March 2008 Paper

A new high-resolution photomask inspection system for contamination detection

Bo Mu, Aditya Dayal, Lih-Huah Yiin, Jinggang Zhu, John Miller, Gregg Inderhees

Proceedings Volume 6922, 69222B (2008) https://doi.org/10.1117/12.773201

KEYWORDS: Inspection, Reticles, SRAF, Photomasks, Contamination, Calibration, Algorithm development, Detection and tracking algorithms, Semiconducting wafers, Sensors

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Proceedings Article | 15 June 2006 Paper

Spectral classification of sources in XMM-Newton x-ray observation of the rapidly accreting young star V1647 Ori

Bo Mu, Joel Kastner, Nicolas Grosso

Proceedings Volume 6266, 626630 (2006) https://doi.org/10.1117/12.671985

KEYWORDS: Independent component analysis, X-rays, Principal component analysis, Charge-coupled devices, Stars, X-ray sources, Spectroscopy, Statistical analysis, X-ray imaging, Astronomy

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Proceedings Article | 17 October 2001 Paper

IP-based restoration algorithm for optical networks

Mianfeng Lin, Chunbo Mu, Laifu Fang, Jie Zhang, Wanyi Gu

Proceedings Volume 4585, (2001) https://doi.org/10.1117/12.445181

KEYWORDS: Networks, Optical networks, Wavelength division multiplexing, Transponders, Floods, Algorithm development, Chemical elements, Optical components, Telecommunications, Switching

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Showing 5 of 10 publications

Conference Committee Involvement (3)

Digital Photography and Mobile Imaging XI

9 February 2015 | San Francisco, California, United States

Digital Photography X

3 February 2014 | San Francisco, California, United States

Digital Photography IX

4 February 2013 | Burlingame, California, United States

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