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C. H. Twu
at United Microelectronics Corp
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Author
Publications (3)
Proceedings Article | 26 September 2019 Paper
Characterization of quartz etched depth and optical density of opaque pattern for the wafer CD behavior on advanced mask
William Chou, Jeffrey Cheng, C. Twu, Adder Lee, Chih Hsuan Chao, Xin Ren Yu, Po Tsang Chen, Edgar Huang, Junjin Lin, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Heng Jen Lee, Young Ham
Proceedings Volume 11148, 111481I (2019) https://doi.org/10.1117/12.2537938
KEYWORDS: Quartz, Photomasks, Critical dimension metrology, Semiconducting wafers, 3D metrology, Immersion lithography, Etching, Lithography, Binary data
Proceedings Article | 3 October 2018 Paper
Hotspot analysis and empirical correction through mask and wafer technology harmonization
Yohan Choi, William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Hong Jen Lee, Michael Green, Mohamed Ramadan, Young Ham, Chris Progler
Proceedings Volume 10810, 108101K (2018) https://doi.org/10.1117/12.2501427
KEYWORDS: Optical proximity correction, Photomasks, Lithography
Proceedings Article | 16 October 2017 Paper
Process window discovery from mask inspection for hotspot analysis and verification
James Cheng, William Chou, C. Twu, Hsin-Fu Chou, Jackie Cheng, Colbert Lu, Heng-Jen Lee, Bosheng Zhang, Mehdi Daneshpanah, Apo Sezginer, David Wu, Mike Yeh, Albert Chien
Proceedings Volume 10451, 104510X (2017) https://doi.org/10.1117/12.2281215
KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Lithography, 3D modeling, Near field, Photoresist materials, Semiconducting wafers
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