Ms. Emmanuelle Luce Profile

Emmanuelle Luce

at STMicroelectronics

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Author

Publications (4)

Proceedings Article | 16 June 2003 Paper

Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

Laurent Pain, Murielle Charpin, Yves Laplanche, David Herisson, J. Todeschini, Ramiro Palla, A. Beverina, H. Leininger, S. Tourniol, M. Broekaart, Emmanuelle Luce, F. Judong, K. Brosselin, Y. Le Friec, F. Leverd, S. Del Medico, V. De Jonghe, Daniel Henry, M. Woo, F. Arnaud

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482336

KEYWORDS: Etching, Electron beam lithography, Lithography, Semiconducting wafers, Optical alignment, Photomasks, Chemistry, Scanners, Oxides, CMOS technology

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Proceedings Article | 30 July 2002 Paper

Impact of synchronization errors on overlay and CD control

Emmanuelle Luce, Sebastien Mougel, Pierre-Jerome Goirand, Jerome Depre

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474634

KEYWORDS: Critical dimension metrology, Modeling, Optical lithography, Electroluminescence, Semiconducting wafers, Scanners, Reticles, Optical proximity correction, Tolerancing, Photoresist processing

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Proceedings Article | 5 July 2000 Paper

Across field and across wafer flare: from KrF stepper to ArF scanner

Yorick Trouiller, Emmanuelle Luce, Alexandra Barberet, L. Depre, Patrick Schiavone

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389084

KEYWORDS: Semiconducting wafers, Scanners, Photoresist processing, Light scattering, Stray light, Bottom antireflective coatings, Critical dimension metrology, Deep ultraviolet, Silicon, Microelectronics

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Proceedings Article | 26 July 1999 Paper

Flare impact on the intrafield CD control for sub-0.25-um patterning

Emmanuelle Luce, Blandine Minghetti, Patrick Schiavone, Olivier Toublan, Andre Weill

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354349

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photomasks, Scanners, Reflectivity, Reflection, Optical lithography, Scanning electron microscopy, Error analysis

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