Dr. Daniel Henry Profile

Dr. Daniel Henry

Advanced Patterning Programmer at STMicroelectronics

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Author

Publications (16)

Proceedings Article | 5 November 2005 Paper

Demonstration of a new mask structure using a bonded hard pellicle

Philippe Thony, Béatrice Biasse, Marc Zussy, Giovanni Bianucci, Pietro Cantu', Daniel Henry

Proceedings Volume 5992, 59920X (2005) https://doi.org/10.1117/12.631719

KEYWORDS: Pellicles, Photomasks, Silica, Lithography, Chromium, Monochromatic aberrations, Semiconducting wafers, Databases, Optical lithography, Critical dimension metrology

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Proceedings Article | 27 August 2005 Paper

Influence of the real-life structures in optical metrology using spectroscopic scatterometry analysis

R. Quintanilha, J. Hazart, P. Thony, D. Henry

Proceedings Volume 5858, 58580C (2005) https://doi.org/10.1117/12.612081

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reflectometry, Scatter measurement, Ellipsometry, Scanning electron microscopy, Spectroscopy, Lithography, Edge roughness

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Proceedings Article | 12 May 2005 Paper

Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Emilien Robert, Philippe Thony, Kevin Lucas, Daniel Henry, Bryan Kasprowicz, Sergei Postnikov, Will Conley, Wei Wu, Lloyd Litt

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601743

KEYWORDS: Chromium, Photomasks, Scattering, Semiconducting wafers, Optical proximity correction, Lithography, Phase shifts, Scanners, Diffraction, Etching

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Proceedings Article | 12 May 2005 Paper

Assessment of complementary double dipole lithography for 45nm and 32nm technologies

Sergei Postnikov, Emilien Robert, Philippe Thony, Kyle Patterson, Scott Warrick, Daniel Henry, Andres Torres, Olivier Toublan

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601756

KEYWORDS: Photomasks, Lithography, Monte Carlo methods, Critical dimension metrology, Optical proximity correction, Polarization, Lithographic illumination, Optical lithography, SRAF, Nanoimprint lithography

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Proceedings Article | 10 May 2005 Paper

Application of spectroscopic scatterometry method in hole matrices analysis

R. Quintanilha, J. Hazart, P. Thony, D. Henry

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599373

KEYWORDS: Scatterometry, Matrices, Critical dimension metrology, Spectroscopy, Scatter measurement, Silicon, Scanning electron microscopy, Dielectrics, Diffraction, Semiconducting wafers

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Proceedings Article | 6 May 2005 Paper

Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction

L. Pain, M. Jurdit, J. Todeschini, S. Manakli, B. Icard, B. Minghetti, G. Bervin, A. Beverina, F. Leverd, M. Broekaart, P. Gouraud, V. De Jonghe, Ph. Brun, S. Denorme, F. Boeuf, V. Wang, D. Henry

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601498

KEYWORDS: Photomasks, Electron beam direct write lithography, Manufacturing, Lithography, Optical proximity correction, Semiconducting wafers, Optics manufacturing, Optical lithography, Standards development, Photoresist processing

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Proceedings Article | 6 May 2005 Paper

Device based evaluation of electron projection lithography

Carmelo Romeo, Pietro Cantu, Daniel Henry, Hidekazu Takekoshi, Noriyuki Hirayanagi, Kazuaki Suzuki, Martin McCallum, Hiroshi Fujita, Tadahiko Takikawa, Morihisa Hoga

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598751

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Optical lithography, Manufacturing, Etching, Projection lithography, Electron beams, Silicon, Printing

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Proceedings Article | 4 May 2005 Paper

Electron beam direct write process development for sub 45nm CMOS manufacturing

J. Todeschini, Laurent Pain, S. Manakli, B. Icard, V. DeJonghe, B. Minghetti, M. Jurdit, D. Henry, V. Wang

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601616

KEYWORDS: Line width roughness, Electron beam direct write lithography, Semiconducting wafers, Electron beam lithography, Electron beams, Manufacturing, Etching, Photoresist processing, Coating, Semiconductors

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Proceedings Article | 24 May 2004 Paper

3D features analysis using spectroscopic scatterometry

Richard Quintanilha, Philippe Thony, Daniel Henry, Jerome Hazart

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.537192

KEYWORDS: Scatterometry, Scatter measurement, Spectroscopy, Ellipsometry, Matrices, Semiconducting wafers, Critical dimension metrology, Optical metrology, Software development, Silicon

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Proceedings Article | 20 May 2004 Paper

Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions

Laurent Pain, M. Jurdit, Yves LaPlanche, J. Todeschini, Serdar Manakli, G. Bervin, Ramiro Palla, A. Beverina, R. Faure, X. Bossy, H. Leininger, S. Tourniol, M. Broekaart, F. Judong, K. Brosselin, P. Gouraud, Veronique De Jonghe, Daniel Henry, M. Woo, Peter Stolk, B. Tavel, F. Arnaud

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537188

KEYWORDS: Electron beam direct write lithography, Manufacturing, Semiconducting wafers, Lithography, Optical alignment, Control systems, Electron beam lithography, Photomasks, Photoresist processing, Optics manufacturing

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Proceedings Article | 16 June 2003 Paper

Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction

Laurent Pain, Murielle Charpin, Yves Laplanche, David Herisson, J. Todeschini, Ramiro Palla, A. Beverina, H. Leininger, S. Tourniol, M. Broekaart, Emmanuelle Luce, F. Judong, K. Brosselin, Y. Le Friec, F. Leverd, S. Del Medico, V. De Jonghe, Daniel Henry, M. Woo, F. Arnaud

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482336

KEYWORDS: Etching, Electron beam lithography, Lithography, Semiconducting wafers, Optical alignment, Photomasks, Chemistry, Scanners, Oxides, CMOS technology

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Proceedings Article | 16 June 2003 Paper

Mix and match capability of e-beam direct-write for the 65-nm technology

Yves Laplanche, Murielle Charpin, Laurent Pain, J. Todeschini, Daniel Henry, Pierre-Olivier Sassoulas, S. Gough, Ulf Weidenmueller, Peter Hahmann

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482342

KEYWORDS: Semiconducting wafers, Scanners, Optical alignment, Electron beam direct write lithography, Distortion, Overlay metrology, Electron beam lithography, Photomasks, Optical lithography, Error analysis

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Proceedings Article | 2 June 2003 Paper

Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration

David Herisson, DaniEle Neira, Cyril Fernand, Philippe Thony, Daniel Henry, Stephanie Kremer, Marco Polli, Marco Guevremont, Assim Elazami

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485031

KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Lithography, Scanning electron microscopy, Scatterometry, Metrology, Spectroscopic ellipsometry, Electron microscopes, Process control, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application (high resolution) or production application (high sensitivity)

Murielle Charpin, Laurent Pain, Serge Tedesco, C. Gourgon, A. Andrei, Daniel Henry, Yves LaPlanche, Ryotaro Hanawa, Tadashi Kusumoto, Masumi Suetsugu, H. Yokoyama

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474193

KEYWORDS: Polymers, Electron beam lithography, Etching, Lithography, Palladium, Industrial chemicals, Semiconducting wafers, Diffusion, Prototyping, Critical dimension metrology

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Proceedings Article | 1 July 2002 Paper

Shaped e-beam lithography integration work for advanced ASIC manufacturing: progress report

Laurent Pain, Murielle Charpin, Yves LaPlanche, Daniel Henry

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472335

KEYWORDS: Semiconducting wafers, Photomasks, Photoresist processing, Standards development, Etching, Lithography, Electron beam lithography, Manufacturing, Optical lithography, Prototyping

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Proceedings Article | 23 May 1997 Paper

Automotive exhaust gas analysis by infrared tunable diode laser absorption spectroscopy

Yolande Louvet, Eric de Borniol, Daniel Henry, Ajmal Mohamed, Bernard Rosier, W. Jones

Proceedings Volume 3108, (1997) https://doi.org/10.1117/12.274775

KEYWORDS: Carbon monoxide, Absorption, Temperature metrology, Absorption spectroscopy, Infrared spectroscopy, Infrared radiation, Tunable diode lasers, Molecules, Infrared lasers, Chlorine

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Showing 5 of 16 publications

Conference Committee Involvement (3)

Emerging Lithographic Technologies IX

1 March 2005 | San Jose, California, United States

Emerging Lithographic Technologies VIII

24 February 2004 | Santa Clara, California, United States

Emerging Lithographic Technologies VII

25 February 2003 | Santa Clara, California, United States

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