CONFERENCE PROCEEDINGS
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Yves T. LaPlanche
at STMicroelectronics
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 20 May 2004 Paper
Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
Laurent Pain, M. Jurdit, Yves LaPlanche, J. Todeschini, Serdar Manakli, G. Bervin, Ramiro Palla, A. Beverina, R. Faure, X. Bossy, H. Leininger, S. Tourniol, M. Broekaart, F. Judong, K. Brosselin, P. Gouraud, Veronique De Jonghe, Daniel Henry, M. Woo, Peter Stolk, B. Tavel, F. Arnaud
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537188
KEYWORDS: Electron beam direct write lithography, Manufacturing, Semiconducting wafers, Lithography, Optical alignment, Control systems, Electron beam lithography, Photomasks, Photoresist processing, Optics manufacturing
Proceedings Article | 16 June 2003 Paper
Mix and match capability of e-beam direct-write for the 65-nm technology
Yves Laplanche, Murielle Charpin, Laurent Pain, J. Todeschini, Daniel Henry, Pierre-Olivier Sassoulas, S. Gough, Ulf Weidenmueller, Peter Hahmann
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482342
KEYWORDS: Semiconducting wafers, Scanners, Optical alignment, Electron beam direct write lithography, Distortion, Overlay metrology, Electron beam lithography, Photomasks, Optical lithography, Error analysis
Proceedings Article | 16 June 2003 Paper
Advanced patterning studies using shaped e-beam lithography for 65-nm CMOS preproduction
Laurent Pain, Murielle Charpin, Yves Laplanche, David Herisson, J. Todeschini, Ramiro Palla, A. Beverina, H. Leininger, S. Tourniol, M. Broekaart, Emmanuelle Luce, F. Judong, K. Brosselin, Y. Le Friec, F. Leverd, S. Del Medico, V. De Jonghe, Daniel Henry, M. Woo, F. Arnaud
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482336
KEYWORDS: Etching, Electron beam lithography, Lithography, Semiconducting wafers, Optical alignment, Photomasks, Chemistry, Scanners, Oxides, CMOS technology
Proceedings Article | 24 July 2002 Paper
Negative-tone CAR resists for e-beam lithography: modification of chemical composition for R&D application (high resolution) or production application (high sensitivity)
Murielle Charpin, Laurent Pain, Serge Tedesco, C. Gourgon, A. Andrei, Daniel Henry, Yves LaPlanche, Ryotaro Hanawa, Tadashi Kusumoto, Masumi Suetsugu, H. Yokoyama
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474193
KEYWORDS: Polymers, Electron beam lithography, Etching, Lithography, Palladium, Industrial chemicals, Semiconducting wafers, Diffusion, Prototyping, Critical dimension metrology
Proceedings Article | 1 July 2002 Paper
Shaped e-beam lithography integration work for advanced ASIC manufacturing: progress report
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472335
KEYWORDS: Semiconducting wafers, Photomasks, Photoresist processing, Standards development, Etching, Lithography, Electron beam lithography, Manufacturing, Optical lithography, Prototyping
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