Dr. Fumio Murai Profile

Dr. Fumio Murai

at JSTA

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 20 August 2004 Paper

Proximity-effect correction software for EPL using the pattern classify method

Shigeki Mori, Akio Sato, Kyoji Nakajo, Masanori Shoji, Naomi Shimada, Hirokazu Sambayashi, Kenzo Goto, Fumio Murai, Hiroshi Fukuda

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557820

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Projection lithography, Software development, Silicon, Scattering, Monte Carlo methods, Optical proximity correction, Analytical research

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Proceedings Article | 28 August 2003 Paper

Proximity-effect correction for EPL by using multiple pattern-area-density maps and pattern classification

Fumio Murai, Hiroshi Fukuda, Shigeki Mori, Akio Sato, Kyoji Nakajo

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504235

KEYWORDS: Image classification, Backscatter, Data processing, Optical aberrations, Electron beams, Data corrections, Lithography, Monochromatic aberrations, Double patterning technology, Projection lithography

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Proceedings Article | 1 August 2002 Paper

Method for generating complementary mask data for an EPL stencil mask using a commercial pattern operation tool

Akemi Moniwa, Fumio Murai

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476994

KEYWORDS: Photomasks, Semiconducting wafers, Scattering, Projection lithography, Reliability, Metals, Lithography, Electron beams, Electronic design automation, Analytical research

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Proceedings Article | 1 July 2002 Paper

Experimental investigation of the Coulomb effect in electron projection lithography (EPL)

Jiro Yamamoto, Fumio Murai, Akemi Moniwa

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472270

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Lithography, Projection lithography, Distortion, Optical simulations, Chemically amplified resists, Photoresist processing, Optical lithography

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Proceedings Article | 11 March 2002 Paper

Practical complementary mask-data generation for EPL stencil masks using general geometrical operation tools

Akemi Moniwa, Fumio Murai

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458368

KEYWORDS: Photomasks, Scattering, Electron beam lithography, Electron beams, Semiconducting wafers, Projection lithography, Lithography, Reliability, Analytical research, Visualization

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Proceedings Article | 14 June 1996 Paper

Contrast-boosted resist using a polarity-change reaction during aqueous base development

Shou-ichi Uchino, Takumi Ueno, Sonoko Migitaka, Jiro Yamamoto, Toshihiko Tanaka, Fumio Murai, Hiroshi Shiraishi, Michiaki Hashimoto

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241842

KEYWORDS: Lithography, Optical lithography, Scanning electron microscopy, Industrial chemicals, Diffusion, Ultraviolet radiation, Absorption, Photography, Analytical research, Photomasks

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Proceedings Article | 5 April 1995 Paper

New optical waveguide structure: a trench-channel-type high-density waveguide in Si

Tohru Nakamura, Takeshi Kato, Tomonori Tanoue, Fumio Murai, Mitsuo Takeda

Proceedings Volume 2400, (1995) https://doi.org/10.1117/12.206298

KEYWORDS: Waveguides, Silicon, Photonic integrated circuits, Optical interconnects, Channel waveguides, Capacitance, Integrated circuits, Neural networks, Logic devices, Resistance

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Proceedings Article | 1 August 1991 Paper

Multiple scattered electron-beam effect in electron-beam lithography

Norio Saitou, Teruo Iwasaki, Fumio Murai

Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47355

KEYWORDS: Scattering, Semiconducting wafers, Carbon, Lithography, Copper, Polymethylmethacrylate, Wafer-level optics, Multiple scattering, Silicon, Quantitative analysis

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Proceedings Article | 1 October 1990 Paper

Study of Si-coupled superconducting FETs using microfabrication technologies

Mutsuko Hatano, Toshikazu Nishino, Haruhiro Hasegawa, Fumio Murai, Tokuo Kure, Hideaki Nakane

Proceedings Volume 1287, (1990) https://doi.org/10.1117/12.20887

KEYWORDS: Superconductors, Silicon, Aluminum, Niobium, Reflection, Semiconductors, Interfaces, Resistance, Boron, Superconductivity

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Showing 5 of 9 publications

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