Mr. Gerry M. Blumenstock Profile

Gerry M. Blumenstock

Senior Director at Veeco Instruments Inc

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Author

Publications (6)

Proceedings Article | 27 January 2005 Paper

Evolution of light source technology to support immersion and EUV lithography

Gerry Blumenstock, Christine Meinert, Nigel Farrar, Anthony Yen

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.577587

KEYWORDS: Light sources, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Deep ultraviolet, Image resolution, Optical lithography, Immersion lithography, Plasma, Resolution enhancement technologies

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Proceedings Article | 30 July 2002 Paper

Production-ready 4-kHz ArF laser for 193-nm lithography

Choonghoon Oh, Vladimir Fleurov, Thomas Hofmann, Thomas Duffey, F. Trintchouk, Patrick O'Keeffe, Peter Newman, Gerry Blumenstock

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474567

KEYWORDS: Lithography, Argon ion lasers, Control systems, Semiconductors, Semiconducting wafers, Optical lithography, Laser applications, Reliability, Yield improvement, Energy efficiency

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Proceedings Article | 14 September 2001 Paper

Next-generation 193-nm laser for sub-100-nm lithography

Thomas Duffey, Gerry Blumenstock, Vladimir Fleurov, Xiaojiang Pan, Peter Newman, Holger Glatzel, Tom Watson, J. Erxmeyer, Ralf Kuschnereit, Bernhard Weigl

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435654

KEYWORDS: Lithography, Laser development, Laser applications, Optical lithography, Semiconducting wafers, Electrodes, Excimer lasers, Optical coatings, Light emitting diodes, Semiconductors

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Proceedings Article | 5 July 2000 Paper

Behavior of fused silica materials for microlithography irradiated at 193 nm with low-fluence ArF radiation for tens of billions of pulses

Richard Morton, Richard Sandstrom, Gerry Blumenstock, Zsolt Bor, Chris Van Peski

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389038

KEYWORDS: Head, Birefringence, Silica, Absorption, Calibration, Optical lithography, Deep ultraviolet, Interferometry, Beam splitters, Optics manufacturing

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Proceedings Article | 14 July 1995 Paper

High-reflectance coatings and materials for the extreme ultraviolet

Ritva Keski-Kuha, John Osantowski, Gerry Blumenstock, Jeffrey Gum, Charles Fleetwood, Douglas Leviton, Timo Saha, John Hagopian, June Tveekrem, Geraldine Wright

Proceedings Volume 2428, (1995) https://doi.org/10.1117/12.213712

KEYWORDS: Reflectivity, Mirrors, Silicon carbide, Optical coatings, Extreme ultraviolet, Ion beams, Polishing, Multilayers, Chemical vapor deposition, Contamination

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Showing 5 of 6 publications

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