Dr. Thomas P. Duffey Profile

Dr. Thomas P. Duffey

System Architect at ASML

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Author

Publications (7)

Proceedings Article | 31 March 2014 Paper

Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography

R. Burdt, J. Thornes, T. Duffey, T. Bibby, R. Rokitski, E. Mason, J. Melchior, T. Aggarwal, D. Haran, J. Wang, G. Rechtsteiner, M. Haviland, D. Brown

Proceedings Volume 9052, 90522K (2014) https://doi.org/10.1117/12.2048082

KEYWORDS: Light sources, Semiconducting wafers, Lithography, Semiconductors, Scanners, Light, Optical amplifiers, Switching, Optical lithography, Near field optics

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Proceedings Article | 30 July 2002 Paper

Production-ready 4-kHz ArF laser for 193-nm lithography

Choonghoon Oh, Vladimir Fleurov, Thomas Hofmann, Thomas Duffey, F. Trintchouk, Patrick O'Keeffe, Peter Newman, Gerry Blumenstock

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474567

KEYWORDS: Lithography, Argon ion lasers, Control systems, Semiconductors, Semiconducting wafers, Optical lithography, Laser applications, Reliability, Yield improvement, Energy efficiency

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Proceedings Article | 14 September 2001 Paper

Next-generation 193-nm laser for sub-100-nm lithography

Thomas Duffey, Gerry Blumenstock, Vladimir Fleurov, Xiaojiang Pan, Peter Newman, Holger Glatzel, Tom Watson, J. Erxmeyer, Ralf Kuschnereit, Bernhard Weigl

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435654

KEYWORDS: Lithography, Laser development, Laser applications, Optical lithography, Semiconducting wafers, Electrodes, Excimer lasers, Optical coatings, Light emitting diodes, Semiconductors

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Proceedings Article | 5 July 2000 Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele, Palash Das, Thomas Duffey, Todd Embree, Alexander Ershov, Vladimir Fleurov, Steven Grove, Paul Melcher, Richard Ness, Gunasiri Padmabandu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388986

KEYWORDS: Optical lithography, Sensors, 193nm lithography, Pulsed power, Laser stabilization, Control systems, Laser applications, Optics manufacturing, Fabry–Perot interferometers, Optical components

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Proceedings Article | 5 July 2000 Paper

Feasibility of highly line-narrowed F2 laser for 157-nm microlithography

Alexander Ershov, Thomas Duffey, Eckehard Onkels, William Partlo, Richard Sandstrom

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388992

KEYWORDS: Molybdenum, Optical amplifiers, Fabry–Perot interferometers, Optical design, Amplifiers, Spectroscopy, Diffraction gratings, Optical lithography, Resonators, Beam splitters

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Proceedings Article | 7 April 1999 Paper

Dependence of compaction in fused silica on laser pulsewidth at 248 nm (Abstract Only)

Richard Sandstrom, Richard Morton, Thomas Duffey

Proceedings Volume 3578, (1999) https://doi.org/10.1117/12.344434

KEYWORDS: Silica, Excimer lasers, Interferometry, Pulsed laser operation, Deep ultraviolet, Lithographic lenses, Light sources, Excimers, Laser induced damage, Mathematics

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Proceedings Article | 29 June 1998 Paper

ArF lasers for production of semiconductor devices with CD<0.15 um

Thomas Duffey, Todd Embree, Toshihiko Ishihara, Richard Morton, William Partlo, Tom Watson, Richard Sandstrom

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310731

KEYWORDS: Lithography, Laser applications, Pulsed laser operation, Semiconductors, Excimer lasers, Laser stabilization, Optical damage, Semiconductor lasers, Diffraction gratings, Pulsed power

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Showing 5 of 7 publications

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