Dr. Hideo Hada Profile

Dr. Hideo Hada

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 1 April 2009 Paper

A study of the photo acid generator material design for chemically amplified photoresists

Y. Utsumi, T. Seshimo, Y. Komuro, A. Kawaue, K. Ishiduka, K. Matsuzawa, Hideo Hada, J. Onodera

Proceedings Volume 7273, 72732F (2009) https://doi.org/10.1117/12.815190

KEYWORDS: Diffusion, Lithography, Polymers, Semiconducting wafers, Molecular interactions, Photoresist materials, Sensors, Hydrogen, Silicon, Chemically amplified resists

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Proceedings Article | 1 April 2009 Paper

Decomposition analysis of molecular resists to further CD control

Daiju Shiono, Hideo Hada, Taku Hirayama, Junichi Onodera, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 7273, 727330 (2009) https://doi.org/10.1117/12.815173

KEYWORDS: Surface roughness, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Coating, Molecules, Chemical analysis, Atomic force microscopy, Light sources, Spectroscopy

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Proceedings Article | 12 April 2007 Paper

Distribution control of protecting groups and its effect on LER for EUV molecular resist

Daiju Shiono, Hideo Hada, Hiroto Yukawa, Hiroaki Oizumi, Iwao Nishiyama, Kyoko Kojima, Hiroshi Fukuda

Proceedings Volume 6519, 65193U (2007) https://doi.org/10.1117/12.711311

KEYWORDS: Line edge roughness, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Inspection, Scanning electron microscopy, Analytical research, Optical lithography, Silicon films, Silicon

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Proceedings Article | 22 March 2007 Paper

Material design of negative-tone polyphenol resist for EUV and EB lithography

Kyoko Kojima, Shigeki Mori, Daiju Shiono, Hideo Hada, Junichi Onodera

Proceedings Volume 6519, 65191D (2007) https://doi.org/10.1117/12.711759

KEYWORDS: Lithography, Extreme ultraviolet lithography, Line edge roughness, Extreme ultraviolet, Semiconductors, Molybdenum, Polymers, Inspection, Chromatography, Molecules

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Proceedings Article | 29 March 2006 Paper

Characteristics of low E_a 193-nm chemical amplification resists

Toshiyuki Ogata, Yohei Kinoshita, Sanae Furuya, Shogo Matsumaru, Motoki Takahashi, Daiju Shiono, Takahiro Dazai, Hideo Hada, Masamitsu Shirai

Proceedings Volume 6153, 615328 (2006) https://doi.org/10.1117/12.656199

KEYWORDS: Polymers, Plasma, Argon, Printing, Surface roughness, Lithography, FT-IR spectroscopy, Scanning electron microscopy, Photoresist processing, Electroluminescence

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Proceedings Article | 29 March 2006 Paper

Optimization of photoacid generator in CA resist for EUVL

Takeo Watanabe, Hideo Hada, Hiroo Kinoshita, Yuzuru Tanaka, Hideaki Shiotani, Yasuyuki Fukushima, Hiroji Komano

Proceedings Volume 6153, 615343 (2006) https://doi.org/10.1117/12.656266

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, FT-IR spectroscopy, Ions, Line edge roughness, Polymers, Spectroscopy, Mass spectrometry, Annealing, Electron beams

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Proceedings Article | 29 March 2006 Paper

Negative-tone polyphenol resist based on chemically amplified polarity change reaction with sub-50-nm resolution capability

Kyoko Kojima, Takashi Hattori, Hiroshi Fukuda, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera

Proceedings Volume 6153, 61530G (2006) https://doi.org/10.1117/12.656112

KEYWORDS: Line edge roughness, Lithography, Scanning electron microscopy, Etching, FT-IR spectroscopy, Potassium, Silicon, Extreme ultraviolet lithography, Inspection, Polymers

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Proceedings Article | 29 March 2006 Paper

Molecular resists based on cholate derivatives for electron-beam lithography

Daiju Shiono, Taku Hirayama, Hideo Hada, Junichi Onodera, Tadashi Arai, Atsuko Yamaguchi, Kyoko Kojima, Hiroshi Shiraishi, Hiroshi Fukuda

Proceedings Volume 6153, 61532D (2006) https://doi.org/10.1117/12.656949

KEYWORDS: Lithography, Etching, Silicon, Silicon films, Semiconducting wafers, FT-IR spectroscopy, Line edge roughness, Absorbance, Glasses, Argon

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Proceedings Article | 4 May 2005 Paper

Development of optically transparent cyclic olefin photoresist binder resins

Larry Rhodes, Chun Chang, Cheryl Burns, Dennis Barnes, Brian Bennett, Larry Seger, Xiaoming Wu, Andy Sobek, Mike Mishak, Craig Peterson, Leah Langsdorf, Hideo Hada, Hiroaki Shimizu, Kazuhito Sasaki

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600051

KEYWORDS: Polymers, Absorbance, Photoresist materials, Etching, Palladium, Lithography, Transparency, Polymerization, Resistance, Hydrogen

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Proceedings Article | 4 May 2005 Paper

Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Taku Hirayama, Daiju Shiono, Shogo Matsumaru, Toshiyuki Ogata, Hideo Hada, Junichi Onodera, Tadashi Arai, Toshio Sakamizu, Atsuko Yamaguchi, Hiroshi Shiraishi, Hiroshi Fukuda, Mitsuru Ueda

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600416

KEYWORDS: Line edge roughness, Ions, Scanning electron microscopy, Lithography, Etching, Polymers, Electron beams, Silicon, Semiconducting wafers, Inspection

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Proceedings Article | 20 May 2004 Paper

Evaluation of resist outgassing by EUV irradiation

Hideo Hada, Takeo Watanabe, Kazuhiko Hamamoto, Hiroo Kinoshita, Hiroshi Komano

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534972

KEYWORDS: Polymers, Extreme ultraviolet, Protactinium, Extreme ultraviolet lithography, Chemical species, Carbon, Lithography, Reflectivity, Spectroscopy, Electroluminescence

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Proceedings Article | 12 June 2003 Paper

Investigation of the polymer systems for ArF resists

Mitsuharu Yamana, Masumi Hirano, Seiji Nagahara, Kunihiko Kasama, Hideo Hada, Miwa Miyairi, Shinichi Kohno, Takeshi Iwai

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485105

KEYWORDS: Etching, Monochromatic aberrations, Polymers, Surface roughness, Resistance, Carbon, Lithography, Oxides, Photomasks, Chemical species

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Proceedings Article | 1 July 2002 Paper

Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT

K. Hamamoto, Takeo Watanabe, Hideo Hada, Hiroshi Komano, Shinji Kishimura, Shinji Okazaki, Hiroo Kinoshita

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472272

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Wafer-level optics, Chemically amplified resists, Mirrors, Chromium, Edge roughness, Silicon, Scanning electron microscopy

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Proceedings Article | 21 July 2000 Paper

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Shigeo Irie, Shigeru Shirayone, Shigeyasu Mori, Ei Yano, Hideo Hada, Katsumi Ohmori, Hiroshi Komano

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390100

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Chemically amplified resists, Lithography, Image resolution, Wafer-level optics, Mirrors, Photomasks, Scanning electron microscopy, Ultraviolet radiation

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Proceedings Article | 11 June 1999 Paper

Chemically amplified negative-tone resist using novel acryl polymer for 193-nm lithography

Hideo Hada, Takeshi Iwai, Toshimasa Nakayama

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350254

KEYWORDS: Polymers, Etching, Lithography, 193nm lithography, Scanning electron microscopy, Standards development, Optical lithography, Absorption, Catalysis, Photoresist materials

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Showing 5 of 15 publications

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