Dr. Jangho Shin Profile

Dr. Jangho Shin

Manager, Senior Field Apps Engineer

SPIE Involvement:

Author

Area of Expertise:

Semiconductor Processing , Optical Lithography , Alignment , Overlay Metrology , Computational lithography , Defect inspection metrology

Profile Summary

Jangho (Jerry) Shin is presently a senior manager of field apps engineering at ASML Korea. He was a researcher/manager at Samsung semiconductor R&D and is a Senior member of SPIE. Dr. Shin received his PhD in electrical and computer engineering from the University of Wisconsin at Madison in 2003.

Publications (19)

Proceedings Article | 22 February 2021 Poster + Paper

Poster + Paper

Enhancing model accuracy and calibration efficiency with image-based pattern selection using machine learning techniques

Ren-Cheng Sun, Dae-Kwon Kang, Chester Jia, Meng Liu, De-Bao Shao, Young-Seok Kim, Jangho Shin, Mark Simmons, Qian Zhao, Mu Feng, Yiqiong Zhao, Shibing Wang, Sungho Kim, Sungwoo Ko, Shinyoung Kim, Jaeseung Choi, Chanha Park

Proceedings Volume 11613, 116130Y (2021) https://doi.org/10.1117/12.2584692

KEYWORDS: Calibration, Machine learning, Signal processing, Physics, Optical proximity correction, Metrology, Lithography, Computational lithography

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Proceedings Article | 28 March 2017 Presentation + Paper

Presentation + Paper

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones

Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

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Proceedings Article | 24 March 2017 Presentation + Paper

Presentation + Paper

Scanner-to-scanner CD analysis and control in an HVM environment

Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung

Proceedings Volume 10147, 101470A (2017) https://doi.org/10.1117/12.2258339

KEYWORDS: Critical dimension metrology, Scanners, Lithographic illumination, Image processing, Process control, Computational lithography, Semiconducting wafers, Data modeling, Metrology, Photomasks, Calibration, Finite element methods, Laser scanners, 3D scanning

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SPIE Journal Paper | 1 July 2010

Impact of total measurement uncertainty on overlay error correction

Jangho Shin, Jeong-Ho Yeo, Young-Seog Kang, Woosung Han

JM3, Vol. 9, Issue 03, 033001, (July 2010) https://doi.org/10.1117/12.10.1117/1.3459941

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Proceedings Article | 2 April 2010 Paper

Paper

The impact of total measurement uncertainty (TMU) on overlay error correction

Jangho Shin, Jeongho Yeo, Young-Seog Kang, Woosung Han

Proceedings Volume 7638, 76382F (2010) https://doi.org/10.1117/12.845823

KEYWORDS: Overlay metrology, Semiconducting wafers, Semiconductors, Optical lithography, Data modeling, Optical alignment, Scanners, Lithography, Metrology, Inspection

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SPIE Journal Paper | 1 July 2009

Application results of lot-to-lot high-order and per-shot overlay correction for sub-60-nm memory device fabrication

Jangho Shin, Sangmo Nam, Taekyu Kim, Yong-Kug Bae, Junghyeon Lee

JM3, Vol. 8, Issue 03, 033008, (July 2009) https://doi.org/10.1117/12.10.1117/1.3210241

KEYWORDS: Semiconducting wafers, Overlay metrology, Scanners, Semiconductors, Optical alignment, Optical lithography, Metrology, Process control, Source mask optimization, Electronics

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Proceedings Article | 23 March 2009 Paper

Paper

Application results of lot-to-lot high-order overlay correction for sub-60-nm memory device fabrication

Jangho Shin, Sangmo Nam, Taekyu Kim, Yong-Kug Bae, Junghyeon Lee

Proceedings Volume 7272, 72721R (2009) https://doi.org/10.1117/12.812193

KEYWORDS: Overlay metrology, Semiconducting wafers, Scanners, Semiconductors, Reticles, Optical lithography, Source mask optimization, Optical alignment, Metrology, Process control

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Proceedings Article | 26 March 2008 Paper

Paper

Diffraction based overlay metrology for alpha-carbon applications

Chandra Saru Saravanan, Asher Tan, Prasad Dasari, Gary Goelzer, Nigel Smith, Seouk-Hoon Woo, Jang Ho Shin, Hyun Jae Kang, Ho Chul Kim

Proceedings Volume 6922, 69222W (2008) https://doi.org/10.1117/12.775811

KEYWORDS: Semiconducting wafers, Overlay metrology, Diffraction, Scatterometry, Spectroscopy, Diffraction gratings, Photomasks, Silicon, Reflectivity, Optical alignment

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Proceedings Article | 5 April 2007 Paper

Paper

Overlay metrology for dark hard mask process: simulation and experiment study

Jangho Shin, Roman Chalykh, Hyunjae Kang, SeongSue Kim, SukJoo Lee, Han-Ku Cho

Proceedings Volume 6518, 65182U (2007) https://doi.org/10.1117/12.711389

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Optical alignment, Image processing, Photoresist materials, Semiconductors, Image quality, Scanners, Lithography

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Proceedings Article | 5 April 2007 Paper

Paper

Image analysis of alignment and overlay marks with compound structure

Roman Chalykh, Irina Pundaleva, Jang-Ho Shin, Seong-Sue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277

KEYWORDS: Overlay metrology, Optical alignment, Antireflective coatings, Image analysis, Coating, Semiconductors, Image quality, Finite-difference time-domain method, Optical lithography, Semiconducting wafers

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Proceedings Article | 24 March 2006 Paper

Paper

Investigation on polarization monitoring mask: pattern design and experimental verification

Chan Hwang, Dong-Woon Park, Jang-Ho Shin, Dong-Seok Nam, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6152, 61521M (2006) https://doi.org/10.1117/12.657054

KEYWORDS: Polarization, Photomasks, Polarizers, Semiconducting wafers, Diffraction, Optical lithography, Lithographic illumination, Reticles, Critical dimension metrology, Printing

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Proceedings Article | 24 March 2006 Paper

Paper

Macro analysis of line edge and line width roughness

Jangho Shin, Jinyoung Yoon, Youngjae Jung, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6152, 61520X (2006) https://doi.org/10.1117/12.655516

KEYWORDS: Line width roughness, Software development, Photoresist materials, Edge roughness, Transistors, Critical dimension metrology, Polarization, Statistical analysis, Spectrum analysis, Semiconductors

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Proceedings Article | 12 May 2005 Paper

Paper

Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598655

KEYWORDS: Fiber optic illuminators, Reticles, Semiconducting wafers, Image sensors, Photoresist materials, Overlay metrology, Optical lithography, Scanners, Optics manufacturing, Metrology

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Proceedings Article | 12 May 2005 Paper

Paper

Requirement of in-field illumination control for low k1 imaging below 0.3

Chan Hwang, Jangho Shin, Suk-Joo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599532

KEYWORDS: Critical dimension metrology, Error analysis, Lithographic illumination, Error control coding, Control systems, Optical lithography, Imaging systems, Computer simulations, Lithography, Optical proximity correction

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Proceedings Article | 10 May 2005 Paper

Paper

Influence of material on process focus budget and process window of 80nm DRAM devices

Sung Won Choi, SukJoo Lee, Jangho Shin, Sang-Gyun Woo, HanKu Cho, Joo-Tae Moon

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600166

KEYWORDS: Semiconducting wafers, Scanners, Phase shifts, Polishing, Photomasks, Lithography, Optical lithography, Materials processing, Digital signal processing, Phase shift keying

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Proceedings Article | 14 May 2004 Paper

Paper

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100 nm device performance

Ji-Young Lee, Jangho Shin, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534926

KEYWORDS: Line width roughness, Line edge roughness, Transistors, Critical dimension metrology, Etching, Photoresist materials, Semiconducting wafers, Lithography, Spatial frequencies, Failure analysis

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Proceedings Article | 14 May 2004 Paper

Paper

Evaluation of puddle time effect and optimization of development process in 193nm lithography

Hyung-Rae Lee, Jangho Shin, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534908

KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Line edge roughness, Electroluminescence, Photoresist processing, 193nm lithography, Photomasks, Scanning electron microscopy, Optical lithography

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Proceedings Article | 29 April 2004 Paper

Paper

Advanced module-based approach to effective CD prediction of sub-100nm patterns

Jangho Shin, Insung Kim, Chan Hwang, Dong-Woon Park, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.536345

KEYWORDS: Photomasks, Diffusion, Convolution, Lithography, Lithographic illumination, Semiconductors, Image sensors, Semiconducting wafers, Scanners, Electron beams

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Proceedings Article | 12 June 2003 Paper

Paper

Synthesis and evaluation of novel organoelement resists for EUV lithography

Junyan Dai, Christopher Ober, Sang-Ouk Kim, Paul Nealey, Victoria Golovkina, Jangho Shin, Lin Wang, Franco Cerrina

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485116

KEYWORDS: Polymers, Silicon, Extreme ultraviolet lithography, Etching, Line edge roughness, Extreme ultraviolet, Resistance, Reactive ion etching, Oxygen, Boron

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Showing 5 of 19 publications

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