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Masatomo Takahara
at KLA-Tencor Japan
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Publications (1)
Proceedings Article | 10 April 2024 Poster + Paper
Leveraging x-ray scatterometry and machine learning to enable robust and high-throughput optical critical dimension metrology for advanced 3D flash memory contact hole profile
Houssam Chouaib, Teng Shi, Anderson Chou, Shinya Kawanami, Masatomo Takahara, Yeunchian Luo, Zhijie Leiyin, Bin Zeng, Derrick Shaughnessy, Zhengquan Tan, Kaori Sasaki, Naoki Momotori
Proceedings Volume 12955, 129553F (2024) https://doi.org/10.1117/12.3010992
KEYWORDS: Critical dimension metrology, 3D metrology, 3D modeling, Education and training, Scatterometry, Metrology, Machine learning, X-ray optics, X-rays, Semiconducting wafers
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