Mr. MunSik Kim Profile

MunSik Kim

at SK Hynix Inc

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 23 October 2015 Paper

Advanced repair solution of clear defects on HTPSM by using nanomachining tool

Hyemi Lee, Munsik Kim, Hoyong Jung, Sangpyo Kim, Donggyu Yim

Proceedings Volume 9635, 96351J (2015) https://doi.org/10.1117/12.2196941

KEYWORDS: Quartz, Etching, Deposition processes, Photomasks, Critical dimension metrology, Phase shifts, Scanning electron microscopy, Particles, Chromium, Image restoration

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Proceedings Article | 9 July 2015 Paper

The method of quartz damage recovery in the photomask repair process

Hoon Namkung, MunSik Kim, EuiSang Park, HoYong Jung, SangPyo Kim, DongGyu Yim

Proceedings Volume 9658, 965806 (2015) https://doi.org/10.1117/12.2193081

KEYWORDS: Quartz, Photomasks, Critical dimension metrology, Distortion, Light scattering, Silica, Particles, Surface roughness, Optical lithography, Defect detection

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Proceedings Article | 16 September 2014 Paper

Defects caused by blank masks and repair solution with nanomachining for 20nm node

HyeMi Lee, ByungJu Kim, MunSik Kim, HoYong Jung, Sang Pyo Kim, DongGyu Yim

Proceedings Volume 9235, 92350G (2014) https://doi.org/10.1117/12.2066278

KEYWORDS: Photomasks, Inspection, Particles, Scanning electron microscopy, Manufacturing, Image processing, Chromium, Defect detection, Defect inspection, Transmittance

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Proceedings Article | 26 May 2010 Paper

New critical dimension uniformity measurement concept based reticle inspection tool

Kangjoon Seo, MunSik Kim, Sang Chul Kim, JaeCheon Shin, ChangYeol Kim, John Miller, Aditya Dayal, Trent Hutchinson, KiHun Park

Proceedings Volume 7748, 77480N (2010) https://doi.org/10.1117/12.864109

KEYWORDS: Photomasks, Reticles, Inspection, Critical dimension metrology, Reflectivity, Semiconducting wafers, Scanning electron microscopy, Manufacturing, Data processing, Scanners

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Proceedings Article | 20 March 2009 Paper

Evaluation of shadowing and flare effect for EUV tool

James Moon, Cheol-Kyun Kim, Byoung-Sub Nam, Byoung-Ho Nam, Yoon-Suk Hyun, Suk-Kyun Kim, Chang-Moon Lim, Yong-Dae Kim, Mun-Sik Kim, Yong-Kyoo Choi, Chang-Reol Kim, Donggyu Yim

Proceedings Volume 7271, 727144 (2009) https://doi.org/10.1117/12.814364

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Semiconducting wafers, Lithography, Photomasks, Scanning electron microscopy, Wafer testing, Silicon, Light scattering

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Proceedings Article | 17 October 2008 Paper

The study of CD behavior due to transmission control position change within photomask substrate

Munsik Kim, Hyemi Lee, Sungha Woo, Kangjoon Seo, Yongkyoo Choi, Changyeol Kim

Proceedings Volume 7122, 712239 (2008) https://doi.org/10.1117/12.801432

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Quartz, Control systems, Printing, Refractive index, Laser scattering, Optical lithography, Ultrafast lasers

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Proceedings Article | 2 May 2008 Paper

Design of pattern-specific mask grating for giving the effect of an off-axis illumination

Young-Seok Kim, Seok Ho Song, Jong Ung Lee, Sung Hyun Oh, Yong Kyoo Choi, Munsik Kim, Beom-Hoan O, Se-Geun Park, El-Hang Lee, Seung Gol Lee

Proceedings Volume 6792, 67920R (2008) https://doi.org/10.1117/12.798809

KEYWORDS: Photomasks, Lithographic illumination, Optical design, Chromium, Lithography, Quartz, Atrial fibrillation

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Proceedings Article | 21 March 2008 Paper

EUV mask inspection tool using high NA DUV inspection tool

Yongkyoo Choi, Sunghyun Oh, Munsik Kim, Yongdae Kim, Changreol Kim

Proceedings Volume 6921, 692123 (2008) https://doi.org/10.1117/12.773145

KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Deep ultraviolet, Reflectivity, Defect inspection, Extreme ultraviolet lithography, EUV optics, Etching, Defect detection

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Proceedings Article | 1 November 2007 Paper

The study for close correlation of mask and wafer to optimize wafer field CD uniformity

Munsik Kim, Jaesung Kang, Shinchul Kang, Goomin Jeong, Yongkyoo Choi, Oscar Han

Proceedings Volume 6730, 67304V (2007) https://doi.org/10.1117/12.746846

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Scanning electron microscopy, Optical testing, Wafer-level optics, Reliability, Scatterometry, Quartz, Transmittance

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Proceedings Article | 15 May 2007 Paper

The optimization of CD uniformity and measurement on mask and wafer

Yongkyoo Choi, Munsik Kim, Oscar Han

Proceedings Volume 6607, 66071W (2007) https://doi.org/10.1117/12.728979

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Cadmium, Scanning electron microscopy, Line edge roughness, Transmittance, Optical lithography, Image filtering, Image enhancement

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Proceedings Article | 5 April 2007 Paper

The study to enhance the mask global CD uniformity by removing local CD variation

Yongkyoo Choi, Munsik Kim, Oscar Han

Proceedings Volume 6518, 65183E (2007) https://doi.org/10.1117/12.712848

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Scanning electron microscopy, Cadmium, Transmittance, Optical lithography, Photoresist processing, Error analysis, Scatter measurement

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Proceedings Article | 20 October 2006 Paper

Multi-point CD measurement method to evaluate pattern fidelity and performance of mask

Munsik Kim, Hyemi Lee, Kanjoon Seo, Dongwook Lee, Yongkyoo Choi, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, 634944 (2006) https://doi.org/10.1117/12.686473

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Image filtering, Line edge roughness, Anisotropic filtering, Time metrology, Anisotropic diffusion, Scatterometry, Metrology

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Proceedings Article | 20 October 2006 Paper

CD measurement evaluation on periodic patterns between optic tools and CD-SEM

Yongkyoo Choi, Munsik Kim, Sunghyun Oh, Oscar Han

Proceedings Volume 6349, 63491N (2006) https://doi.org/10.1117/12.686461

KEYWORDS: Critical dimension metrology, Scatterometry, Photomasks, Scanning electron microscopy, Deep ultraviolet, Image enhancement, Metrology, Wafer-level optics, Transmittance, Calibration

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Proceedings Article | 20 May 2006 Paper

The CD measuring repeatability enhancement by intensity gradient

Yongkyoo Choi, Sangpyo Kim, Munsik Kim, Oscar Han

Proceedings Volume 6283, 62832F (2006) https://doi.org/10.1117/12.681789

KEYWORDS: Critical dimension metrology, Image filtering, Nonlinear filtering, Scanning electron microscopy, Image enhancement, Diffusion, Anisotropic filtering, Photomasks, Image processing, Image resolution

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Proceedings Article | 6 December 2004 Paper

Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Dong Wook Lee, Ho Yong Jung, Mun Sik Kim, Jun Sik Lee, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569015

KEYWORDS: Ions, Ultraviolet radiation, Oxygen, Chemical analysis, Contamination, Phase shifts, Photomasks, Air contamination, Atomic force microscopy, Transmission electron microscopy

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Proceedings Article | 20 August 2004 Paper

Investigation of Cr defect in high Cr load logic mask

Ho-Yong Jung, Sung Jin Choi, Mun-Sik Kim, Dong Wook Lee, Junsik Lee, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557677

KEYWORDS: Chromium, Logic, Etching, Dry etching, Photomasks, Scanning electron microscopy, Image processing, Photoresist processing, Inspection, Atomic force microscopy

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Proceedings Article | 20 August 2004 Paper

Investigation of sub-pellicle defect formation at KrF lithography

Junsik Lee, Dong Wook Lee, Mun-Sik Kim, Ho-Yong Jung, Oscar Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557703

KEYWORDS: Pellicles, Ions, Photomasks, Reticles, Adhesives, Inspection, Chemical analysis, Raman spectroscopy, Chromatography, Scanning electron microscopy

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Proceedings Article | 22 January 2001 Paper

Develop process optimization for CD uniformity improvement

Jae-Cheon Shin, Joon-Il Won, Ho-Yong Jung, Mun-Sik Kim, Yong-Kyoo Choi, Oscar Han

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410735

KEYWORDS: Photomasks, Photoresist processing, Fluctuations and noise, Etching, Critical dimension metrology, Mask making, Optical lithography, Chemical reactions, Plasma etching, Semiconducting wafers

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Showing 5 of 18 publications

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