Dr. Pierre M. Fanton Profile

Dr. Pierre M. Fanton

at STMicroelectronics

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Author

Publications (5)

Proceedings Article | 28 April 2023 Poster + Paper

Robust and automated methodology for scanner matching using contour-based analysis

Jean Gabriel Simiz, Romain Alestra, Romain Bange, Julien Ducoté, Florent Dettoni, Pierre Fanton

Proceedings Volume 12494, 1249412 (2023) https://doi.org/10.1117/12.2657686

KEYWORDS: Scanners, Light sources and illumination, Semiconducting wafers, Contour extraction, Image filtering, Lithography, Automation, Scanning electron microscopy

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Proceedings Article | 28 March 2017 Paper

Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology

Amine Lakcher, Bertrand Le-Gratiet, Julien Ducoté, Pierre Fanton, Ton Kiers, Jan-Willem Gemmink, Stefan Hunsche, Christopher Prentice, Maxime Besacier

Proceedings Volume 10145, 1014514 (2017) https://doi.org/10.1117/12.2257876

KEYWORDS: Etching, Metrology, Lithography, Scanning electron microscopy, Inspection, Process control, Manufacturing, Process engineering, Chemical mechanical planarization, Copper, Semiconducting wafers, Metals, Image processing, Optical alignment

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Proceedings Article | 28 March 2017 Paper

Advanced in-production hotspot prediction and monitoring with micro-topography

P. Fanton, T. Hasan, A. Lakcher, B. Le-Gratiet, C. Prentice, J.-G. Simiz, R. La Greca, L. Depre, S. Hunsche

Proceedings Volume 10145, 101450X (2017) https://doi.org/10.1117/12.2260024

KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Electron beam lithography, Scanners, Finite element methods, Scanning electron microscopy, Lithography, Inspection, Computational lithography

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Proceedings Article | 24 March 2016 Paper

Resist 3D model based OPC for 28nm metal process window enlargement

P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert

Proceedings Volume 9778, 97781U (2016) https://doi.org/10.1117/12.2218916

KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability

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Proceedings Article | 8 March 2016 Paper

Process window optimizer for pattern based defect prediction on 28nm metal layer

P. Fanton, R. La Greca, V. Jain, C. Prentice, J.-G. Simiz, S. Hunsche, B. Le-Gratiet, L. Depre

Proceedings Volume 9778, 97782O (2016) https://doi.org/10.1117/12.2220295

KEYWORDS: Semiconducting wafers, Process control, Metals, Photomasks, Data processing, Defect detection, 3D modeling, Image processing, Lithography, Computational lithography, Scanners, Finite element methods, Optical lithography, Etching, Metrology, Scanning electron microscopy

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