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Zhen Shi
at ASML-Brion China, Inc.
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Publications (1)
Proceedings Article | 20 March 2019 Paper
Robust alignment mark design for DRAM using a holistic computational approach
Proceedings Volume 10961, 109610Z (2019) https://doi.org/10.1117/12.2532841
KEYWORDS: Optical proximity correction, Optical alignment, Semiconducting wafers, Optical lithography, Signal processing, Printing, Metrology, Overlay metrology
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