PROCEEDINGS VOLUME 11908
PHOTOMASK JAPAN 2021 | 20-21 APRIL 2021
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology
Editor(s): Akihiko Ando
Editor Affiliations +
IN THIS VOLUME

13 Sessions, 32 Papers, 0 Presentations, 0 Posters
ML & MPC  (3)
Lithography  (2)
NIL  (3)
Inspection  (4)
Proceedings Volume 11908 is from: Logo
PHOTOMASK JAPAN 2021
20-21 April 2021
Online Only, Japan
Front Matter: Volume 11908
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190801 (2021) https://doi.org/10.1117/12.2612386
Opening Session: Day One
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190802 (2021) https://doi.org/10.1117/12.2607440
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190803 (2021) https://doi.org/10.1117/12.2601389
ML & MPC
Mohamed Ramadan, Brian Dillon, Michael Green, Chris Progler, Young Ham, Ahmad Syukri
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190804 (2021) https://doi.org/10.1117/12.2601855
Ajay Baranwal, Suhas Pillai, Thang Nguyen, Jun Yashima, Jim Dewitt, Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190805 (2021) https://doi.org/10.1117/12.2601856
Wai Yip Kwok, Johnny Yeap, Sebastian Munoz, Seurien Chou, Tokiharu Sekiya, Hari Konnanur
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190806 (2021) https://doi.org/10.1117/12.2601035
EUV from Asia I
T. Watanabe, T. Harada, S. Yamakawa
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190807 (2021) https://doi.org/10.1117/12.2600896
Lithography
Toshiyuki Horiuchi, Hiroshi Kobayashi
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190808 (2021) https://doi.org/10.1117/12.2597232
Tomoaki Osumi, Masaru Sasago, Masaaki Yasuda, Yoshihiko Hirai
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190809 (2021) https://doi.org/10.1117/12.2598156
PSM, Etching & FPD
Kazuaki Matsui, Naoto Yonemaru, Yosuke Kojima, Tatsuya Nagatomo, Mitsuharu Yamana
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080A (2021) https://doi.org/10.1117/12.2601771
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080B (2021) https://doi.org/10.1117/12.2598157
Opening Session: Day Two
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080C (2021) https://doi.org/10.1117/12.2601110
NIL
Yoshinori Kagawa, Machiko Suenaga, Hikaru Sasaki, Koji Murano, Shunko Magoshi, Ryu Komatsu, Kosuke Takai, Mitsuru Kondo, Hideaki Sakurai, et al.
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080D (2021) https://doi.org/10.1117/12.2603907
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080E (2021) https://doi.org/10.1117/12.2600797
Ryo Tanaka, Mitsuru Hiura, Yukio Takabahashi, Atsushi Kimura, Hiroshi Morohoshi, Yoshio Suzaki, Takahiro Matsumoto, Nilabh Roy, Anshuman Cherala, et al.
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080F (2021) https://doi.org/10.1117/12.2599713
EUV from Asia II
Ching-Te Kuo, Kuoaki Hung, Claire Lee, Chia-Ho Chuang, Bill Chiu
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080G (2021) https://doi.org/10.1117/12.2598101
Inspection
Hiroki Miyai, Tsunehito Kohyama, Toshiyuki Todoroki
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080H (2021) https://doi.org/10.1117/12.2601872
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080I (2021) https://doi.org/10.1117/12.2601995
Tadayuki Sugimori, Riki Ogawa, Hidekazu Takekoshi, John G. Hartley, David J. Pinckney, Atsushi Ando, Koichi Ishii, Chosaku Noda, Nobutaka Kikuiri
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080J (2021) https://doi.org/10.1117/12.2598235
Tosyo Cho, Sui Ryu, Syoryu Cho
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080K (2021) https://doi.org/10.1117/12.2595839
Writing & CD Analysis
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080L (2021) https://doi.org/10.1117/12.2604378
Ulrich Hofmann, Holger Sailer, Stephan Martens, Nezih Unal
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080M (2021) https://doi.org/10.1117/12.2604372
Pavel Nesládek, Frank Schurack, Olga Hortenbach, Michael Finken
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080N (2021) https://doi.org/10.1117/12.2599510
Poster Session
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080O (2021) https://doi.org/10.1117/12.2601395
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080P (2021) https://doi.org/10.1117/12.2601122
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080Q (2021) https://doi.org/10.1117/12.2601123
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080R (2021) https://doi.org/10.1117/12.2597680
Akira Heya, Tetsuo Harada, Masahito Niibe, Koji Sumitomo, Takeo Watanabe
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080S (2021) https://doi.org/10.1117/12.2597935
Takuto Fujii, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080T (2021) https://doi.org/10.1117/12.2600986
Tetsuo Harada, Ayato Ohgata, Shinji Yamakawa, Takeo Watanabe
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080U (2021) https://doi.org/10.1117/12.2601080
Asei Chou, Wenhao Hsu, Andy Lan, Jason Fang, Claire Lu, Harper Yu, Zeyu Lei, Catherine Li, Steven Liu, et al.
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080V (2021) https://doi.org/10.1117/12.2598020
Opening Session: Day Two: Additional Paper
V. Vijay
Proceedings Volume Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080W (2021) https://doi.org/10.1117/12.2613075
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