Mr. Takashi Suganuma Profile

Takashi Suganuma

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 13 October 2021 Presentation + Paper

Presentation + Paper

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou

Proceedings Volume 11854, 118540K (2021) https://doi.org/10.1117/12.2600714

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Mirrors, Plasma, Laser systems engineering, Extreme ultraviolet lithography, Light sources, Reflectivity, Laser development

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Proceedings Article | 20 September 2020 Presentation

Presentation

Update of >300W high power LPP-EUV source challenge for semiconductor HVM

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Yutaka Shiraishi, Yoshifumi Ueno, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Takashi Saitou, Hirokazu Hosoda, Hiroaki Tomuro, Shinji Nagai, Gouta Niimi, Takashi Suganuma

Proceedings Volume 11517, 115170Q (2020) https://doi.org/10.1117/12.2574707

KEYWORDS: Mirrors, Semiconductors, Extreme ultraviolet, Carbon dioxide lasers, Extreme ultraviolet lithography, Light sources, Magnetism, Magnetic semiconductors, Tin, Pulsed laser operation

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Proceedings Article | 13 January 2017 Paper

Paper

QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

Krzysztof Michał Nowak, Takashi Suganuma, Yoshiaki Kurosawa, Takeshi Ohta, Yasufumi Kawasuji, Hiroaki Nakarai, Takashi Saitou, Junichi Fujimoto, Hakaru Mizoguchi, Akira Sumitani, Akira Endo

Proceedings Volume 10254, 102540W (2017) https://doi.org/10.1117/12.2256003

KEYWORDS: Carbon dioxide lasers, Pulsed laser operation, Oscillators, Gas lasers, Carbon monoxide, Quantum cascade lasers, Extreme ultraviolet, Laser applications, Semiconductor lasers, Optical amplifiers

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Proceedings Article | 23 March 2012 Paper

Paper

Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source

Takeshi Ohta, Krzysztof Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Yasufumi Kawasuji, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 8322, 83222O (2012) https://doi.org/10.1117/12.916586

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Oscillators, Laser systems engineering, Amplifiers, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, High power lasers

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Proceedings Article | 8 April 2011 Paper

Paper

Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source

Junichi Fujimoto, Takeshi Ohta, Krzysztof Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Koji Fujitaka, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 7969, 79692S (2011) https://doi.org/10.1117/12.879181

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Light sources, Laser systems engineering, Extreme ultraviolet lithography, Mirrors, Pulsed laser operation, Plasma, Distortion, Thermography

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Proceedings Article | 7 April 2011 Paper

Paper

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hitoshi Nagano, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Akihiko Kurosu, Krzysztof Nowak, Takashi Suganuma, Masato Moriya, Kouji Kakizaki, Akira Sumitani, Hidenobu Kameda, Hiroaki Nakarai, Junichi Fujimoto

Proceedings Volume 7969, 796908 (2011) https://doi.org/10.1117/12.880382

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Plasma systems, Extreme ultraviolet lithography, Light sources, Laser systems engineering, Mirrors, Magnetism

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Proceedings Article | 18 May 2009 Paper

Paper

Characterization of tin vapor from CO[sub]2[/sub] laser produced EUV light source

Yoshifumi Ueno, Tatsuya Yanagida, Takashi Suganuma, Hiroshi Komori, Akira Sumitani, Akira Endo

Proceedings Volume 7361, 73610X (2009) https://doi.org/10.1117/12.820966

KEYWORDS: Tin, Ions, Liquids, Plasma, Carbon dioxide lasers, Laser induced fluorescence, Solids, Chemical species, Extreme ultraviolet, Pulsed laser operation

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Proceedings Article | 18 March 2009 Paper

Paper

Evaluation at the intermediate focus for EUV light source

Takashi Suganuma, Georg Soumagne, Masato Moriya, Tamotsu Abe, Akira Sumitani, Akira Endo

Proceedings Volume 7271, 727133 (2009) https://doi.org/10.1117/12.813494

KEYWORDS: Extreme ultraviolet, Mirrors, Carbon dioxide lasers, Light sources, Plasma, Tin, Optical filters, Extreme ultraviolet lithography, Reflectivity, Optical filtering

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Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 14 May 2008 Paper

Paper

Efficient and compact short pulse MOPA system for laser-produced-plasma extreme-UV sources employing RF-discharge slab-waveguide CO2 amplifiers

Krzysztof Nowak, Takashi Suganuma, Akira Endo, Akira Sumitani, Dmitri Goryachkin, Nikolay Romanov, Vladimir Sherstobitov, Lev Kovalchuk, Andrey Yu. Rodionov

Proceedings Volume 7005, 70051Q (2008) https://doi.org/10.1117/12.782606

KEYWORDS: Optical amplifiers, Carbon dioxide lasers, Oscillators, Amplifiers, Pulsed laser operation, Laser applications, Laser systems engineering, Carbon dioxide, Optical components, Extreme ultraviolet

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Proceedings Article | 12 May 2008 Paper

Paper

Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 7005, 70052U (2008) https://doi.org/10.1117/12.782475

KEYWORDS: Tin, Magnetism, Plasma, Ions, Carbon dioxide lasers, Mirrors, Extreme ultraviolet, Light sources, Carbon dioxide, Nd:YAG lasers

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Proceedings Article | 21 March 2008 Paper

Paper

LPP EUV light source employing high power C02 laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692131 (2008) https://doi.org/10.1117/12.771847

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Light sources, Oscillators, Tin, Carbon dioxide, Laser stabilization

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Proceedings Article | 21 March 2008 Paper

Paper

Magnetic debris mitigation of a CO2 laser-produced Sn plasma

Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 69212Z (2008) https://doi.org/10.1117/12.771817

KEYWORDS: Tin, Plasma, Magnetism, Carbon dioxide lasers, Ions, Mirrors, Silicon, Extreme ultraviolet, Gold, Statistical analysis

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Proceedings Article | 20 March 2008 Paper

Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 21 March 2007 Paper

Paper

Small field exposure tool (SFET) light source

Tamotsu Abe, Takashi Suganuma, Masato Moriya, Takayuki Yabu, Takeshi Asayama, Hiroshi Someya, Yoshifumi Ueno, Georg Soumagne, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6517, 65173C (2007) https://doi.org/10.1117/12.711241

KEYWORDS: Plasma, Xenon, Light sources, Extreme ultraviolet, Mirrors, Optical filters, Actuators, Laser development, Extreme ultraviolet lithography, High power lasers

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Proceedings Article | 24 March 2006 Paper

Paper

KrF laser driven xenon plasma light source of a small-field exposure tool

Tamotsu Abe, Masato Moriya, Hiroshi Someya, Georg Soumagne, Takashi Suganuma, Takayuki Watanabe, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 6151, 61513T (2006) https://doi.org/10.1117/12.656228

KEYWORDS: Light sources, Xenon, Plasma, Extreme ultraviolet lithography, Laser development, Mirrors, Lithography, Optical filters, Pulsed laser operation, Liquids

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Proceedings Article | 23 March 2006 Paper

Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 6 May 2005 Paper

Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 6 May 2005 Paper

Paper

Magnetic field ion mitigation for EUV light sources

Hiroshi Komori, Yousuke Imai, Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Akira Endo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600360

KEYWORDS: Ions, Magnetism, Xenon, Plasma, Extreme ultraviolet, Mirrors, Light sources, Pulsed laser operation, Laser energy, Nd:YAG lasers

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Proceedings Article | 27 April 2005 Paper

Paper

High-average power pulsed Yb:YAG thin-disk laser

Taisuke Miura, Takashi Suganuma, Akira Endo, Satoshi Wada

Proceedings Volume 5707, (2005) https://doi.org/10.1117/12.590206

KEYWORDS: Birefringence, Crystals, Continuous wave operation, Polarization, Laser development, Mirrors, Laser resonators, Pulsed laser operation, High power lasers, Electrodes

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Proceedings Article | 8 October 2004 Paper

Paper

Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography

Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Yuichi Takabayashi, Akira Endo

Proceedings Volume 5662, (2004) https://doi.org/10.1117/12.596356

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Liquids, Pulsed laser operation, Nd:YAG lasers, Mirrors, Plasma systems

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Proceedings Article | 20 September 2004 Paper

Paper

Measurements of energy distribution functions of xenon ions from laser-produced plasmas for lithography

Georg Soumagne, Tamotsu Abe, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Akira Endo

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.545933

KEYWORDS: Ions, Xenon, Plasmas, Mirrors, Picosecond phenomena, Microchannel plates, Pulsed laser operation, Reflectivity, Extreme ultraviolet lithography, Lithography

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Proceedings Article | 10 June 2004 Paper

Paper

Emission spectra of laser-produced plasmas for EUV and soft x-ray sources

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5482, (2004) https://doi.org/10.1117/12.558598

KEYWORDS: Plasmas, Picosecond phenomena, Pulsed laser operation, Aluminum, Extreme ultraviolet, Tin, Copper, X-ray sources, Spectrographs, Tungsten

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Proceedings Article | 20 May 2004 Paper

Paper

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Akira Endo, Koichi Toyoda

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534060

KEYWORDS: Ions, Xenon, Plasmas, Magnetism, Mirrors, Extreme ultraviolet, Reflectivity, Microchannel plates, Light sources, Surface roughness

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Proceedings Article | 20 May 2004 Paper

Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda, Yasuhiro Horiike

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536076

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Deformable mirrors, Mirrors, Liquids, Nd:YAG lasers, Oscillators

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Proceedings Article | 7 January 2004 Paper

Paper

Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.503434

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Ions, Liquids, Absorption, Mirrors, Light sources, Data modeling, Pulsed laser operation

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Proceedings Article | 18 November 2003 Paper

Paper

EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Georg Soumagne, Tamotsu Abe, Kenichi Ikeda, Hiroshi Komori, Hiroshi Someya, Takashi Suganuma, Kazuhisa Nakajima, Akira Endo

Proceedings Volume 5063, (2003) https://doi.org/10.1117/12.541149

KEYWORDS: Plasma, Picosecond phenomena, Aluminum, Tin, Copper, Pulsed laser operation, Extreme ultraviolet, Solids, Light sources, Laser energy

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Proceedings Article | 16 June 2003 Paper

Paper

Development of a liquid-jet laser-produced plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Yukihiko Sugimoto, Hiroshi Someya, Hideo Hoshino, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483598

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Extreme ultraviolet lithography, Plasma, Laser systems engineering, Oscillators, Liquids, Amplifiers, Temperature metrology

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Proceedings Article | 30 July 2002 Paper

Paper

Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474613

KEYWORDS: Oscillators, Pulsed laser operation, Amplifiers, Refractor telescopes, Laser development, Laser systems engineering, Projection systems, Laser stabilization, Spectroscopy, Mirrors

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Proceedings Article | 30 July 2002 Paper

Paper

Spectral metrologies for ultra-line-narrowed F2 laser

Takanori Nakaike, Osamu Wakabayashi, Toru Suzuki, Hakaru Mizoguchi, Kiyoharu Nakao, Ryoichi Nohdomi, Tatsuya Ariga, Naoki Kitatochi, Takashi Suganuma, Takahito Kumazaki, Kazuaki Hotta, Masaki Yoshioka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474560

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Laser development, Calibration, Refractor telescopes, Metrology, Light sources, Laser systems engineering, Oscillators, Optical lithography

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Proceedings Article | 14 September 2001 Paper

Paper

High-resolution multigrating spectrometer for high-quality deep-UV light source production

Toru Suzuki, Hirokazu Kubo, Takashi Suganuma, Toshio Yamashita, Osamu Wakabayashi, Hakaru Mizoguchi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435662

KEYWORDS: Spectroscopy, Excimer lasers, Diffraction gratings, Holography, Diffraction, Light sources, Collimators, Surface plasmons, Mirrors, Charge-coupled devices

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Proceedings Article | 14 September 2001 Paper

Paper

Spectral measurement of ultra line-narrowed F2 laser

Osamu Wakabayashi, Jun Sakuma, Toru Suzuki, Hirokazu Kubo, Naoki Kitatochi, Takashi Suganuma, Takanori Nakaike, Takahito Kumazaki, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao, Tadashi Togashi, Yasuo Nabekawa, Shuntaro Watanabe

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435638

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Light sources, Laser development, Michelson interferometers, Calibration, Xenon, Spectral calibration, Excimer lasers, Sapphire lasers

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Showing 5 of 32 publications

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