Dr. Kouji Kakizaki Profile

Dr. Kouji Kakizaki

at Gigaphoton Inc

SPIE Involvement:

Author

Publications (39)

Proceedings Article | 10 April 2024 Presentation

Improved ArFi scanner throughput and process yield through a next generation DUV light source featuring high-repetition rate and enhanced speckle contrast

Toshihiro Oga, Takamitsu Komaki, Takeshi Ohta, Shinichi Matsumoto, Katsuhiko Wakana, Kouji Kakizaki, Takashi Saitou

Proceedings Volume PC12953, PC129530C (2024) https://doi.org/10.1117/12.3009784

KEYWORDS: Scanners, Speckle, Deep ultraviolet, Yield improvement, Optical components, Semiconductors, Semiconducting wafers, Pulsed laser operation, Lithography, Line edge roughness

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Proceedings Article | 10 April 2024 Poster

Analyzing line width roughness (LWR) sensitivity to resist and laser-induced speckle for enhanced PSD-based quantification

Takamitsu Komaki, Tomohiro Iwaki, Yuichi Mukai, Kouichi Fujii, Toshihiro Kobayashi, Toshihiro Ohga, Kouji Kakizaki, Takashi Saito, Risa Yasue, Natsuki Okada, Katsunori Otsuki, Tomonori Okada, Kanji Sugino, Takahito Kumazaki

Proceedings Volume PC12953, PC129530S (2024) https://doi.org/10.1117/12.3008944

KEYWORDS: Speckle, Line width roughness, Semiconductors, Scanners, Lithography, Light sources, Chromatic aberrations

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Proceedings Article | 9 April 2024 Presentation + Paper

Enhancing M2 beam quality factor for high power KrF laser for glass micro-via fabrication in advanced packaging

Yasufumi Kawasuji, Akira Suwa, Yasuhiro Adachi, Tomonari Tanaka, Hironori Igarashi, Kouji Kakizaki

Proceedings Volume 12956, 1295605 (2024) https://doi.org/10.1117/12.3010372

KEYWORDS: Laser resonators, Excimer lasers, Glasses, Semiconductors, Advanced packaging

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Proceedings Article | 1 December 2022 Paper

High-power LPP-EUV source for semiconductor HVM: lithography and other applications

Hakaru Mizoguchi, Hiroaki Nakarai, Yasutsugu Usami, Kouji Kakizaki, Junichi Fujimoto, Takashi Saitou

Proceedings Volume 12292, 122920X (2022) https://doi.org/10.1117/12.2657787

KEYWORDS: Extreme ultraviolet, Mirrors, Deep ultraviolet, Lithography, Light sources, Carbon dioxide lasers, Laser systems engineering, Semiconductors, Photomasks, Inspection

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Proceedings Article | 10 March 2021 Presentation + Paper

Microprocessing machinability of organic material for semiconductor packaging by 248 nm excimer laser

Akira Suwa, Junichi Fujimoto, Yasufumi Kawasuji, Masakazu Kobayashi, Kouji Kakizaki

Proceedings Volume 11673, 116730Y (2021) https://doi.org/10.1117/12.2578165

KEYWORDS: Excimer lasers, Organic materials, Semiconductors, Semiconductor materials, Organic semiconductors, Packaging, Ultraviolet radiation, Materials processing, Laser development, Thermal effects

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Proceedings Article | 5 March 2021 Presentation

Micro-via fabrication of glass material for semiconductor packaging by 248 nm excimer laser

Yasufumi Kawasuji, Akira Suwa, Yasuhiro Adachi, Masakazu Kobayashi, Kouji Kakizaki, Masakazu Washio

Proceedings Volume 11673, 116730E (2021) https://doi.org/10.1117/12.2578038

KEYWORDS: Glasses, Semiconductors, Semiconductor materials, Packaging, Excimer lasers, Semiconducting wafers, Silicon films, Silicon, Pulsed laser operation, Laser drilling

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Proceedings Article | 22 February 2021 Presentation + Paper

Processability of organic material for semiconductor packaging by 248 nm excimer laser

Akira Suwa, Yasufumi Kawasuji, Masakazu Kobayashi, Kouji Kakizaki, Junichi Fujimoto

Proceedings Volume 11610, 116100W (2021) https://doi.org/10.1117/12.2583901

KEYWORDS: Excimer lasers, Semiconductors, Organic materials, Laser processing, Semiconductor materials, Packaging, Organic semiconductors, Materials processing, Ultraviolet radiation, Photomasks

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Proceedings Article | 9 April 2020 Paper

Advanced spectral engineering: Lithography performance improvements by high performance light source

Kouichi Fujii, Takahito Kumazaki, Masakazu Hattori, Yosuke Fujimaki, Toshihiro Oga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 11327, 1132712 (2020) https://doi.org/10.1117/12.2551966

KEYWORDS: Light sources, Lithography, Scanners, Electroluminescence, Semiconducting wafers, Copper indium disulfide, Projection systems, Chromatic aberrations, Optical lithography, Photomasks

Read Abstract +

Proceedings Article | 16 May 2017 Paper

DUV high power lasers processing for glass and CFRP

Masakazu Kobayashi, Kouji Kakizaki, Hiroaki Oizumi, Toshio Mimura, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 10238, 102381D (2017) https://doi.org/10.1117/12.2266233

KEYWORDS: Excimer lasers, Microscopes, Laser ablation, Scanning electron microscopy, Deep ultraviolet, Laser processing, Glasses, High power lasers, Laser cutting, Manufacturing, Laser drilling, Materials processing, Micromachining

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Proceedings Article | 22 February 2017 Presentation + Paper

193nm high power lasers for the wide bandgap material processing

Junichi Fujimoto, Masakazu Kobayashi, Koji Kakizaki, Hiroaki Oizumi, Toshio Mimura, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10097, 100970T (2017) https://doi.org/10.1117/12.2250706

KEYWORDS: Excimer lasers, Deep ultraviolet, Materials processing, High power lasers, Laser processing, Solid state lasers, Semiconductor manufacturing, Reliability, Annealing, Glasses, Laser ablation, Scanning electron microscopy, Infrared lasers, Micromachining, Copper

Read Abstract +

Proceedings Article | 9 November 2016 Paper

High power DUV lasers for material processing

Toshio Mimura, Kouji Kakizaki, Hiroaki Oizumi, Masakazu Kobayashi, Junichi Fujimoto, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 10016, 1001603 (2016) https://doi.org/10.1117/12.2247870

KEYWORDS: Excimer lasers, Laser processing, Deep ultraviolet, Materials processing, High power lasers, Solid state lasers, Heat treatments, Glasses, Pulsed laser operation, Laser bonding

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Proceedings Article | 16 March 2016 Paper

Development of high coherence high power 193nm laser

Satoshi Tanaka, Masaki Arakawa, Atsushi Fuchimukai, Yoichi Sasaki, Takashi Onose, Yasuhiro Kamba, Hironori Igarashi, Chen Qu, Mitsuru Tamiya, Hiroaki Oizumi, Shinji Ito, Koji Kakizaki, Hongwen Xuan, Zhigang Zhao, Yohei Kobayashi, Hakaru Mizoguchi

Proceedings Volume 9726, 972624 (2016) https://doi.org/10.1117/12.2211210

KEYWORDS: Solid state lasers, Excimer lasers, Laser systems engineering, Deep ultraviolet, Optical amplifiers, Amplifiers, Crystals, High power lasers, Semiconducting wafers, Fiber amplifiers

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Proceedings Article | 18 March 2015 Paper

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Takeshi Ohta, Keisuke Ishida, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261A (2015) https://doi.org/10.1117/12.2085006

KEYWORDS: Helium, Gas lasers, Lithography, Neon, Laser development, Semiconducting wafers, Laser applications, Light sources, Gases, Extreme ultraviolet lithography

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Proceedings Article | 18 March 2015 Paper

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takeshi Ohta, Keisuke Ishida, Takahito Kumazaki, Hiroaki Tsushima, Akihiko Kurosu, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9426, 94261J (2015) https://doi.org/10.1117/12.2085631

KEYWORDS: Semiconducting wafers, Algorithm development, Lithography, Control systems, Laser development, Optical components, Laser stabilization, Gases, Helium, Immersion lithography

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Proceedings Article | 20 February 2015 Paper

Development of high coherence, 200mW, 193nm solid-state laser at 6 kHz

T. Nakazato, M. Tsuboi, T. Onose, Y. Tanaka, N. Sarukura, S. Ito, K. Kakizaki, S. Watanabe

Proceedings Volume 9342, 93420P (2015) https://doi.org/10.1117/12.2078601

KEYWORDS: Amplifiers, Crystals, Oscillators, Mirrors, Solid state lasers, Sapphire lasers, Laser systems engineering, Thermal effects, Nonlinear crystals, Laser development

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Proceedings Article | 4 April 2014 Paper

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Hiroaki Tsushima, Hisakazu Katsuumi, Hiroyuki Ikeda, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90521E (2014) https://doi.org/10.1117/12.2046189

KEYWORDS: Excimer lasers, Electrodes, 193nm lithography, Lithography, Laser applications, Light sources, Semiconducting wafers, Neodymium, Optical lithography, Semiconductors

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Proceedings Article | 31 March 2014 Paper

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Hideyuki Ochiai, Yoshinobu Watabe, Keisuke Ishida, Hiroyuki Masuda, Youichi Sasaki, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 9052, 90522E (2014) https://doi.org/10.1117/12.2046128

KEYWORDS: Light sources, Semiconducting wafers, Beam propagation method, Sensors, Polarization, Data acquisition, Lithography, Infrared sensors, Metrology, Liquid crystal lasers

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Proceedings Article | 12 March 2014 Paper

Development of narrow-linewidth Yb- and Er- fiber lasers and frequency mixing for ArF excimer laser seeding

Hongwen Xuan, Zhigang Zhao, Hironori Igarashi, Shinji Ito, Kouji Kakizaki, Yohei Kobayashi

Proceedings Volume 8961, 89612M (2014) https://doi.org/10.1117/12.2038318

KEYWORDS: Fiber lasers, Fiber amplifiers, Optical amplifiers, Excimer lasers, Pulsed laser operation, Ytterbium, Crystals, Nonlinear crystals, Laser systems engineering, Semiconductor lasers

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Proceedings Article | 12 April 2013 Paper

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takeshi Asayama, Youichi Sasaki, Takayuki Nagashima, Akihiko Kurosu, Hiroaki Tsushima, Takahito Kumazaki, Kouji Kakizaki, Takashi Matsunaga, Hakaru Mizoguchi

Proceedings Volume 8683, 86831G (2013) https://doi.org/10.1117/12.2011404

KEYWORDS: Excimer lasers, Lithography, Light sources, 193nm lithography, Semiconducting wafers, Laser stabilization, Laser systems engineering, Pulsed laser operation, High power lasers, Extreme ultraviolet

Read Abstract +

Proceedings Article | 13 March 2012 Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography

Akihiko Kurosu, Masaki Nakano, Masanori Yashiro, Masaya Yoshino, Hiroaki Tsushima, Hiroyuki Masuda, Takahito Kumazaki, Shinichi Matsumoto, Kouji Kakizaki, Takashi Matsunaga, Shinji Okazaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 8326, 83261F (2012) https://doi.org/10.1117/12.916324

KEYWORDS: Excimer lasers, Control systems, Optical lithography, Laser drilling, Gas lasers, Laser development, Semiconducting wafers, Gemini Planet Imager, 193nm lithography, Manufacturing

Read Abstract +

Proceedings Article | 8 April 2011 Paper

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Tatsuya Yanagida, Hitoshi Nagano, Yasunori Wada, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi, Akira Endo

Proceedings Volume 7969, 79692T (2011) https://doi.org/10.1117/12.879189

KEYWORDS: Extreme ultraviolet, Tin, Particles, Carbon dioxide lasers, Plasma, Chemical species, Light sources, Mirrors, Magnetism, Laser irradiation

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Proceedings Article | 7 April 2011 Paper

100W 1st generation laser-produced plasma light source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Tatsuya Yanagida, Hitoshi Nagano, Takayuki Yabu, Shinji Nagai, Georg Soumagne, Akihiko Kurosu, Krzysztof Nowak, Takashi Suganuma, Masato Moriya, Kouji Kakizaki, Akira Sumitani, Hidenobu Kameda, Hiroaki Nakarai, Junichi Fujimoto

Proceedings Volume 7969, 796908 (2011) https://doi.org/10.1117/12.880382

KEYWORDS: Extreme ultraviolet, Carbon dioxide lasers, Tin, Plasma, Plasma systems, Extreme ultraviolet lithography, Light sources, Laser systems engineering, Mirrors, Magnetism

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Present status of laser-produced plasma EUV light source

Hitoshi Nagano, Tamotsu Abe, Shinji Nagai, Masaki Nakano, Yoshihiko Akanuma, Shin Nakajima, Kouji Kakizaki, Akira Sumitani, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 7636, 76363C (2010) https://doi.org/10.1117/12.846273

KEYWORDS: Tin, Ions, Magnetism, Extreme ultraviolet, Etching, Plasma, Mirrors, Gases, Carbon dioxide lasers, Light sources

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Proceedings Article | 20 March 2010 Paper

First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, Akira Endo

Proceedings Volume 7636, 763608 (2010) https://doi.org/10.1117/12.846271

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Tin, Laser systems engineering, Plasma systems, Mirrors, Extreme ultraviolet lithography, Pulsed laser operation

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Proceedings Article | 18 March 2009 Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

Read Abstract +

Proceedings Article | 11 April 2008 Paper

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, Satoshi Tanaka, Yukio Watanabe, Taku Yamazaki, Shinji Nagai, Osamu Wakabayashi, Takashi Matsunaga, Kouji Kakizaki, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242S (2008) https://doi.org/10.1117/12.778430

KEYWORDS: Light sources, Double patterning technology, High power lasers, Laser stabilization, Power supplies, Laser applications, Oscillators, Error analysis, Excimer lasers, Laser development

Read Abstract +

Proceedings Article | 7 March 2008 Paper

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, Kouji Kakizaki, Hiroaki Nakarai, Takashi Matsunaga, Junichi Fujimoto, Hakaru Mizoguchi

Proceedings Volume 6924, 69242R (2008) https://doi.org/10.1117/12.778149

KEYWORDS: Semiconducting wafers, Reliability, Immersion lithography, Light sources, Laser stabilization, Metrology, High power lasers, Spectroscopy, Laser development, Laser applications

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Proceedings Article | 27 March 2007 Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652031 (2007) https://doi.org/10.1117/12.711258

KEYWORDS: Molybdenum, High power lasers, Laser systems engineering, Laser applications, Light sources, Systems modeling, Semiconductors, Lithography, Electrodes, Pulsed laser operation

Read Abstract +

Proceedings Article | 26 March 2007 Paper

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Toru Suzuki, Kouji Kakizaki, Takashi Matsunaga, Satoshi Tanaka, Yasufumi Kawasuji, Masashi Shimbori, Masaya Yoshino, Takahito Kumazaki, Hiroshi Umeda, Hitoshi Nagano, Shinji Nagai, Youichi Sasaki, Hakaru Mizoguchi

Proceedings Volume 6520, 652024 (2007) https://doi.org/10.1117/12.711366

KEYWORDS: Light sources, Spectroscopy, Immersion lithography, Optical proximity correction, Excimer lasers, Lithography, Scanners, Laser applications, Laser development, Critical dimension metrology

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Proceedings Article | 15 March 2006 Paper

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Proceedings Volume 6154, 61542O (2006) https://doi.org/10.1117/12.655474

KEYWORDS: Amplifiers, Excimer lasers, Light sources, Lithography, Magnetism, Resonators, Gas lasers, Reliability, Electrodes, Optical components

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Proceedings Article | 12 May 2005 Paper

Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography

Tsukasa Hori, Takayuki Yabu, Takanobu Ishihara, Takayuki Watanabe, Osamu Wakabayashi, Akira Sumitani, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601438

KEYWORDS: Acoustics, Excimer lasers, Lithography, Pulsed laser operation, Reflectors, Laser development, Computer simulations, Gas lasers, Laser countermeasures, Immersion lithography

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Proceedings Article | 12 May 2005 Paper

High-power injection lock laser platform for ArF dry/wet lithography

H. Mizoguchi, T. Inoue, J. Fujimoto, T. Yamazaki, T. Suzuki, T. Matsunaga, S. Sakanishi, M. Kaminishi, Y. Watanabe, T. Ohta, M. Nakane, M. Moriya, T. Nakaike, M. Shinbori, M. Yoshino, T. Kawasuji, H. Nogawa, T. Ito, H. Umeda, S. Tanaka, H. Taniguchi, Y. Sasaki, J. Kinoshita, T. Abe, H. Tanaka, H. Hayashi, K. Miyao, M. Niwano, A. Kurosu, M. Yashiro, H. Nagano, N. Matsui, T. Mimura, K. Kakizaki, M. Goto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600796

KEYWORDS: Molybdenum, Lithography, High power lasers, Optical lithography, 193nm lithography, Control systems, Light sources, Optical components, Oscillators, Laser development

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Beam quality of a new-type MOPO laser system for VUV laser lithography

Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Koutarou Sasano, Takayuki Watanabe, Takayuki Yabu, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536241

KEYWORDS: Spatial coherence, Fabry–Perot interferometers, Spectroscopy, Laser systems engineering, Lithography, Vacuum ultraviolet, Oscillators, Interferometers, Mirrors, Visibility

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ArF-dry microlithography is currently switching from pre-production to mass-production and the target node is shifted from 90 nm to 65 nm. ArF-wet or F₂ laser lithography will then be an important player for the next generation node below 45 nm. Therefore, high throughput and high-resolution exposure tools for VUV lithography require VUV light sources (ArF and F₂ lasers) with high power and narrow bandwidth. In this paper, we describe the beam quality of the new- type injection lock (MOPO, master oscillator power oscillator) ArF laser system we developed and compare it with the beam quality of a master oscillator power amplifier (MOPA) ArF laser system. A high power and narrow bandwidth ArF laser can be achieved with twin laser chambers in a MOPA or an injection lock laser configuration. Compared to the MOPA system, the injection lock laser system has an excellent performance (e.g. high efficiency, long pulse duration and narrow spectrum). On the other hand, the injection lock system has some disadvantages in beam quality showing high spatial coherence, broadband emission and having a beam profile with a hole. These technical issues have been solved, however, with the following two new breakthrough-technologies: (1) a new-type injection lock system having low spatial coherence and a beam profile with no hole and (2) the optimization of the injection seed energy and discharge timing between the twin chambers for low broadband emission. The spatial coherence, the broadband spectrum and the beam profile of the new-type injection lock system were measured with a Young’s interferometer, a wide range spectrometer with etalons and a 2-dimensional beam profiler, respectively. The new-type injection lock ArF laser system had a lower spatial coherence than a conventional injection lock system, a very low broadband emission level thus preventing deterioration of exposure tools resolution, and a beam profile with no hole. Moreover, we reconfirmed that the new-type injection lock system has the same excellent performance as the conventional injection lock system.

Proceedings Article | 26 June 2003 Paper

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485386

KEYWORDS: Excimer lasers, Lithography, Acoustics, Reliability, Electrodes, Laser development, Laser stabilization, Magnetism, Laser ablation, Fabry–Perot interferometers

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Proceedings Article | 14 September 2001 Paper

Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography

Kouji Kakizaki, Takashi Matsunaga, Yoichi Sasaki, Toyoharu Inoue, Satoshi Tanaka, Akifumi Tada, Hiroaki Taniguchi, Motohiro Arai, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435656

KEYWORDS: Excimer lasers, Argon, Lithography, Electrodes, Pulsed laser operation, Laser development, Laser stabilization, Gas lasers, Laser scanners, 3D scanning

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Proceedings Article | 14 September 2001 Paper

Long pulse duration of F2 laser for 157-nm lithography

Hidenori Watanabe, Naoki Kitatochi, Kouji Kakizaki, Akifumi Tada, Jun Sakuma, Tatsuya Ariga, Kazuaki Hotta

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435639

KEYWORDS: Pulsed laser operation, Oscillators, Laser development, Lithography, Laser systems engineering, Electronics, Optical amplifiers, Laser applications, Reflectivity, Laser resonators

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Proceedings Article | 14 September 2001 Paper

Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography

Takashi Matsunaga, Tatsuo Enami, Kouji Kakizaki, Takashi Saito, Satoshi Tanaka, Hiroaki Nakarai, Toyoharu Inoue, Tatsushi Igarashi

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435703

KEYWORDS: Excimer lasers, Electrodes, Laser scanners, Lithography, 3D scanning, Chromium, Laser development, Pulsed laser operation, Light sources, Molecules

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Proceedings Article | 5 July 2000 Paper

High-repetition-rate ArF excimer laser for 193-nm lithography

Kouji Kakizaki, Takashi Saito, Ken-ichi Mitsuhashi, Motohiro Arai, Akifumi Tada, Shinji Kasahara, Tatsushi Igarashi, Kazuaki Hotta

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388977

KEYWORDS: Excimer lasers, Pulsed laser operation, Laser development, Lithography, Laser energy, Optical lithography, Prototyping, Gas lasers, Laser stabilization, Light sources

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