Dr. Seong-Woon Choi Profile

Dr. Seong-Woon Choi

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (117)

Proceedings Article | 8 November 2012 Paper

Paper

The new test pattern selection method for OPC model calibration, based on the process of clustering in a hybrid space

Dmitry Vengertsev, Kihyun Kim, Seung-Hune Yang, Seongbo Shim, Seongho Moon, Artem Shamsuarov, Sooryong Lee, Seong-Woon Choi, Jungdal Choi, Ho-Kyu Kang

Proceedings Volume 8522, 85221A (2012) https://doi.org/10.1117/12.953827

KEYWORDS: Optical proximity correction, Calibration, Semiconducting wafers, Data modeling, Statistical modeling, Logic devices, Principal component analysis, Model-based design, Lithography, Optics manufacturing

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Proceedings Article | 3 April 2012 Paper

Paper

Optical performance comparison between negative tone development and positive tone development

Seung-Hune Yang, Eun Sung Kim, Seongho Moon, Sooryong Lee, Seong-Woon Choi, Jungdal Choi

Proceedings Volume 8325, 832504 (2012) https://doi.org/10.1117/12.915931

KEYWORDS: Photomasks, Binary data, Critical dimension metrology, Image quality, 3D acquisition, Image processing, Mathematical modeling, Image enhancement, Semiconducting wafers, 3D image processing

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Proceedings Article | 5 April 2011 Paper

Paper

Physical simulation for verification and OPC on full chip level

Seongbo Shim, Seongho Moon, Youngchang Kim, Seongwoon Choi, Younghee Kim, Bernd Küchler, Ulrich Klostermann, Munhoe Do, Sooryoung Lee

Proceedings Volume 7973, 79732I (2011) https://doi.org/10.1117/12.879577

KEYWORDS: Optical proximity correction, Lithography, Signal processing, Image quality, Nanoimprint lithography, Photomasks, Calibration, System on a chip, Data modeling, Computer simulations

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Proceedings Article | 23 March 2011 Paper

Paper

Investigating the performance of directional boundary layer model through staged modeling method

Moon-Gyu Jeong, Won-Chan Lee, Seung-Hune Yang, Sung-Hoon Jang, Seong-Bo Shim, Young-Chang Kim, Chun-Suk Suh, Seong-Woon Choi, Young-Hee Kim

Proceedings Volume 7973, 79732F (2011) https://doi.org/10.1117/12.879604

KEYWORDS: Photomasks, Cadmium, Artificial intelligence, Optical proximity correction, Semiconducting wafers, Performance modeling, Neodymium, Data modeling, Error analysis, Statistical modeling

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Generally speaking, the models used in the optical proximity effect correction (OPC) can be divided into three parts, mask part, optic part, and resist part. For the excellent quality of the OPC model, each part has to be described by the first principles. However, OPC model can't take the all of the principles since it should cover the full chip level calculation during the correction. Moreover, the calculation has to be done iteratively during the correction until the cost function we want to minimize converges. Normally the optic part in OPC model is described with the sum of coherent system (SOCS[1]) method. Thanks to this method we can calculate the aerial image so fast without the significant loss of accuracy. As for the resist part, the first principle is too complex to implement in detail, so it is normally expressed in a simple way, such as the approximation of the first principles, and the linear combinations of factors which is highly correlated with the chemistries in the resist. The quality of this kind of the resist model depends on how well we train the model through fitting to the empirical data. The most popular way of making the mask function is based on the Kirchhoff's thin mask approximation. This method works well when the feature size on the mask is sufficiently large, but as the line width of the semiconductor circuit becomes smaller, this method causes significant error due to the mask topography effect. To consider the mask topography effect accurately, we have to use rigorous methods of calculating the mask function, such as finite difference time domain (FDTD[2]) and rigorous coupled-wave analysis (RCWA[3]). But these methods are too time-consuming to be used as a part of the OPC model. Until now many alternatives have been suggested as the efficient way of considering the mask topography effect. Among them we focused on the boundary layer model (BLM) in this paper. We mainly investigated the way of optimization of the parameters for the BLM since the feasibility of the BLM has been investigated in many papers[4][5][6]. Instead of fitting the parameters to the wafer critical dimensions (CD) directly, we tried to use the aerial image (AI) from the rigorous simulator with the electromagnetic field (EMF) solver. Usually that kind of method is known as the staged modeling method. To see the advantages of this method we conducted several experiments and observed the results comparing the method of fitting to the wafer CD directly. Through the tests we could observe some remarkable results and confirmed that the staged modeling had better performance in many ways.

Proceedings Article | 23 March 2011 Paper

Paper

Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes

Seongho Moon, Seunghune Yang, Artem Shamsuarov, Eunju Kim, Junghoon Ser, Youngchang Kim, Seongwoon Choi, Changjin Kang, Ulrich Klostermann, Bernd Küchler, John Lewellen, Thomas Schmöller, Sooryong Lee

Proceedings Volume 7973, 79730X (2011) https://doi.org/10.1117/12.879592

KEYWORDS: Calibration, Photomasks, Scanning electron microscopy, Cadmium, Metrology, Data modeling, Critical dimension metrology, 3D modeling, Optical proximity correction, Laser metrology

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Proceedings Article | 23 March 2011 Paper

Paper

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyun-Jong Lee, Sungsoo Suh, Jung-Hoon Ser, Seong-Woon Choi, Chang-Jin Kang, Thomas Cecil, Christopher Ashton, David Irby, Xin Zhou, D.H. Son, Guangming Xiao, David Kim

Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

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Proceedings Article | 25 September 2010 Paper

Paper

New method to determine process window considering pattern failure

Seung-Hune Yang, Seongho Moon, Junghoon Ser, Young-Chang Kim, Sung-Woon Choi, Chang-Jin Kang

Proceedings Volume 7823, 78230H (2010) https://doi.org/10.1117/12.864301

KEYWORDS: Bridges, Failure analysis, Critical dimension metrology, Semiconducting wafers, Image processing, Lithography, Image analysis, Optical inspection, Remote sensing, Line edge roughness

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Proceedings Article | 3 April 2010 Paper

Paper

Nanoimprint template fabrication using wafer pattern for sub-30nm

C. Park, K. Kim, Y. Lee, K. Cho, J. Park, In Kim, J. Yeo, S. Choi, D. Lee, B. Lee, S. Hwang

Proceedings Volume 7637, 76371R (2010) https://doi.org/10.1117/12.846481

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Electron beam lithography, Lithography, Line width roughness, Etching, Photomasks, Silicon, Optical lithography, Quartz

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Proceedings Article | 22 March 2010 Paper

Paper

Comparison of OPC models with and without 3D-mask effect

Jung-Hoon Ser, Tae-Hoon Park, Moon-Gyu Jeong, Eun-Mi Lee, Sung-Woo Lee, Chun-Suk Suh, Seong-Woon Choi, Chan-Hoon Park, Joo-Tae Moon

Proceedings Volume 7640, 76401T (2010) https://doi.org/10.1117/12.848317

KEYWORDS: 3D modeling, Optical proximity correction, Photomasks, Cadmium, Semiconducting wafers, Scanning electron microscopy, Semiconductors, Electronics, Scanners, Lithography

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Proceedings Article | 20 March 2010 Paper

Paper

The analysis of EUV mask defects using a wafer defect inspection system

Kyoung-Yong Cho, Joo-On Park, Changmin Park, Young-Mi Lee, In-Yong Kang, Jeong-Ho Yeo, Seong-Woon Choi, Chan-Hoon Park, Steven Lange, SungChan Cho, Robert Danen, Gregory Kirk, Yeon-Ho Pae

Proceedings Volume 7636, 76361E (2010) https://doi.org/10.1117/12.846482

KEYWORDS: Semiconducting wafers, Photomasks, Line width roughness, Inspection, Wafer inspection, Scanning electron microscopy, Defect detection, Signal to noise ratio, Extreme ultraviolet lithography, Line edge roughness

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Proceedings Article | 11 December 2009 Paper

Paper

EUV sensitive photo-acid generator sans chromophore

K. Subramanya Mayya, Yool Kang, Takahiro Yasue, Seok-Hwan Oh, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7520, 75200R (2009) https://doi.org/10.1117/12.837341

KEYWORDS: Extreme ultraviolet lithography, Chromophores, Extreme ultraviolet, Lithography, Optical lithography, Optical transfer functions, Scanning electron microscopy, Electrons, Switches, Polymers

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Proceedings Article | 11 December 2009 Paper

Paper

Development and evaluation of new MRC parameter for aggressive mask optimization

Seong-bo Shim, Young-chang Kim, Seong-hoon Jang, Hee-bom Kim, Sung-woo Lee, Seong-woon Choi, Han-ku Cho, Chan-hoon Park

Proceedings Volume 7520, 75200U (2009) https://doi.org/10.1117/12.839398

KEYWORDS: Photomasks, SRAF, Inspection, Critical dimension metrology, Source mask optimization, Tolerancing, Manufacturing, Image quality, Scanning electron microscopy, Defect inspection

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Proceedings Article | 23 September 2009 Paper

Paper

Revisit to aberration: a simulation study of lens aberration induced overlay misalignment and its experimental validation

Hoyeon Kim, Sung-Woo Lee, Byeongcheol Lee, Sanghwa Lee, Kyoungyong Cho, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7488, 74883E (2009) https://doi.org/10.1117/12.833345

KEYWORDS: Semiconducting wafers, Overlay metrology, Projection systems, Scanners, Monochromatic aberrations, Lithography, Solids, Aberration correction, Metrology, Optical alignment

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Proceedings Article | 11 May 2009 Paper

Paper

Model-based assist feature insertion for sub-40nm memory device

Sungsoo Suh, Suk-joo Lee, Seong-woon Choi, Sung-Woo Lee, Chan-hoon Park

Proceedings Volume 7379, 73792T (2009) https://doi.org/10.1117/12.824343

KEYWORDS: SRAF, Photomasks, Lithography, Optical proximity correction, Instrument modeling, Optical lithography, Manufacturing, Model-based design, Inspection, Optimization (mathematics)

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Proceedings Article | 1 April 2009 Paper

Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

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Proceedings Article | 24 March 2009 Paper

Paper

CD budget analysis on sub-50-nm DRAM device: global CD variation to local CD variation

Chan Hwang, Joon-Soo Park, Jeongho Yeo, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7272, 72722O (2009) https://doi.org/10.1117/12.814476

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Metrology, Error analysis, Line width roughness, Semiconducting wafers, Statistical analysis, Scanners, Computer simulations

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Proceedings Article | 23 March 2009 Paper

Paper

Fast mask CD uniformity measurement using zero order diffraction from memory array pattern

Jinseok Heo, Jinhong Park, Jeongho Yeo, Seongwoon Choi, Woosung Han

Proceedings Volume 7272, 72721S (2009) https://doi.org/10.1117/12.813995

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Critical dimension metrology, Error analysis, Diffraction, Scanners, Printing, Fiber optic illuminators, Charge-coupled devices

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Proceedings Article | 18 March 2009 Paper

Paper

Assessment of full-chip level EUV optical correction for sub-40nm memory device

Jeonghoon Lee, Insung Kim, Doohoon Goo, Joo-on Park, Changmin Park, Jinhong Park, Jeongho Yeo, Seongwoon Choi, Woosung Han

Proceedings Volume 7271, 727142 (2009) https://doi.org/10.1117/12.813996

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical proximity correction, Reflectivity, Scanners, Critical dimension metrology, EUV optics, Optical calibration, Cadmium

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Proceedings Article | 18 March 2009 Paper

Paper

The application of EUV lithography for 40nm node DRAM device and beyond

Joo-on Park, Chawon Koh, Doohoon Goo, InSung Kim, Changmin Park, Jeonghoon Lee, JinHong Park, JeongHo Yeo, Seong-Woon Choi, Chan-hoon Park

Proceedings Volume 7271, 727114 (2009) https://doi.org/10.1117/12.814001

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Photomasks, Semiconducting wafers, Scanners, Optical proximity correction, Light sources, Resistance

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Proceedings Article | 4 December 2008 Paper

Paper

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Yun-kyeong Jang, So-ra Han, Hyoung-hee kim, Jin-Young Yoon, Shi-yong Lee, Kwang-sub Yoon, Seok-hwan Oh, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671

KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

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Proceedings Article | 4 December 2008 Paper

Paper

Optimization of mask manufacturing rule check constraint for model based assist feature generation

Seongbo Shim, Young-chang Kim, Yong-jin Chun, Seong-Woo Lee, Suk-joo Lee, Seong-woon Choi, Woo-sung Han, Seong-hoon Chang, Seok-chan Yoon, Hee-bom Kim, Won-tai Ki, Sang-gyun Woo, Han-gu Cho

Proceedings Volume 7140, 714030 (2008) https://doi.org/10.1117/12.804668

KEYWORDS: SRAF, Photomasks, Manufacturing, Semiconducting wafers, Image quality, Lithography, Optical proximity correction, Tolerancing, Critical dimension metrology, Optimization (mathematics)

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SRAF (sub-resolution assist feature) generation technology has been a popular resolution enhancement technique in photo-lithography past sub-65nm node. It helps to increase the process window, and these are some times called ILT(inverse lithography technology). Also, many studies have been presented on how to determine the best positions of SRAFs, and optimize its size. According to these reports, the generation of SRAF can be formulated as a constrained optimization problem. The constraints are the side lobe suppression and allowable minimum feature size or MRC (mask manufacturing rule check). As we know, bigger SRAF gives better contribution to main feature but susceptible to SRAF side lobe issue. Thus, we finally have no choice but to trade-off the advantages of the ideally optimized mask that contains very complicated SRAF patterns to the layout that has been MRC imposed applied to it. The above dilemma can be resolved by simultaneously using lower dose (high threshold) and cleaning up by smaller MRC. This solution makes the room between threshold (side lobe limitation) and MRC constraint (minimum feature limitation) wider. In order to use smaller MRC restriction without considering the mask writing and inspection issue, it is also appropriate to identify the exact mask writing limitation and find the smart mask constraints that well reflect the mask manufacturability and the e-beam lithography characteristics. In this article, we discuss two main topics on mask optimizations with SRAF. The first topic is on the experimental work to find what behavior of the mask writing ability is in term of several MRC parameters, and we propose more effective MRC constraint for aggressive generation of SRAF. The next topic is on finding the optimum MRC condition in practical case, 3X nm node DRAM contact layer. In fact, it is not easy to encompass the mask writing capability for very complicate real SRAF pattern by using the current MRC constraint based on the only width and space restriction. The test mask for this experimental work includes not only typical split patterns but also real device patterns that are generated by in-house model-based assist feature generation tool. We analyzed the mask writing result for typical patterns and compared the simulation result, and wafer result for real device patterns.

Proceedings Article | 4 December 2008 Paper

Paper

Methodology of flare modeling and compensation in EUVL

Insung Kim, Hoyoung Kang, Changmin Park, Joo-On Park, Jeonghoon Lee, Jinhong Park, Doohoon Goo, Jeongho Yeo, Seong-Woon Choi, Woosung Han

Proceedings Volume 7140, 714009 (2008) https://doi.org/10.1117/12.804673

KEYWORDS: Point spread functions, Fractal analysis, Extreme ultraviolet, Lithography, Optical proximity correction, Photomasks, Critical dimension metrology, Modulation transfer functions, Convolution, Cadmium

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Proceedings Article | 4 December 2008 Paper

Paper

CD uniformity improvement for 3x nm node devices

Chang-Min Park, Hyun-Byuk Kim, Hyung-Do Kim, Hyun-Woo Kim, Cheol-Hong Kim, Joo-On Park, Doohoon Goo, Jeongho Yeo, Seong-Woon Choi, Woo-Sung Han, Min-Su Choi, Sung-Woo Hwang

Proceedings Volume 7140, 714024 (2008) https://doi.org/10.1117/12.804627

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Double patterning technology, Lithography, Etching, Semiconductors, Control systems, Spatial resolution, Transistors

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Proceedings Article | 19 May 2008 Paper

Paper

AF fixer: new incremental OPC method for optimizing assist feature

Sung-Gon Jung, Sang-Wook Kim, Sung-Soo Suh, Young-Chang Kim, Suk-Joo Lee, Sung-Woon Choi, Woo-Sung Han, Joo-Tae Moon, Levi Barnes, Xiaohai Li, Robert Lugg, Sooryong Lee, Kyoil Koo, Munhoe Do, Frank Amoroso, Benjamin Painter

Proceedings Volume 7028, 70280Y (2008) https://doi.org/10.1117/12.793040

KEYWORDS: Atrial fibrillation, Optical proximity correction, Printing, Photomasks, Manufacturing, Scanners, Image segmentation, Process modeling, Optical lithography, Data modeling

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Proceedings Article | 11 April 2008 Paper

Paper

Study of the mask topography effect on the OPC modeling of hole patterns

Seong-bo Shim, Young-chang Kim, Suk-joo Lee, Seong-woon Choi, Woo-sung Han

Proceedings Volume 6924, 69243R (2008) https://doi.org/10.1117/12.774025

KEYWORDS: Photomasks, Optical proximity correction, Data modeling, 3D modeling, Virtual reality, Lithography, Finite-difference time-domain method, Optical simulations, Optical lithography, Apodization

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Proceedings Article | 5 April 2007 Paper

Paper

Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes

Irina Pundaleva, Roman Chalykh, JeungWoo Lee, SeongWoon Choi, Woosung Han

Proceedings Volume 6518, 65180V (2007) https://doi.org/10.1117/12.711233

KEYWORDS: Critical dimension metrology, Scatterometry, Scatter measurement, Precision measurement, Polarization, Cadmium, Finite-difference time-domain method, Photomasks, Process control, Diffraction

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Proceedings Article | 27 March 2007 Paper

Paper

Virtual OPC at hyper NA lithography

Sook Lee, Sang-Wook Kim, Yong-Jin Chun, Sung-Soo Suh, Yun-Kyeong Jang, Suk-Joo Lee, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 6520, 65203X (2007) https://doi.org/10.1117/12.711827

KEYWORDS: Optical proximity correction, Binary data, Photomasks, Chromium, Lithography, Data modeling, Computer simulations, Virtual reality, Scanners, Calibration

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Proceedings Article | 27 March 2007 Paper

Paper

Optical performance enhancement technique for 45-nm-node with binary mask

Jin-Sik Jung, Hee-Bom Kim, Jeung-Woo Lee, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 6520, 652026 (2007) https://doi.org/10.1117/12.711328

KEYWORDS: Oxides, Nanoimprint lithography, Binary data, Manufacturing, Etching, Optics manufacturing, Chromium, Diffraction, Phase shifts, Near field

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Proceedings Article | 27 March 2007 Paper

Paper

Phase-shifted assist feature OPC for sub-45-nm node optical lithography

Gi-Sung Yoon, Hee-Bom Kim, Jeung-Woo Lee, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6520, 65201A (2007) https://doi.org/10.1117/12.712445

KEYWORDS: Photomasks, Optical proximity correction, Diffraction, Semiconducting wafers, Manufacturing, SRAF, Optical lithography, Opacity, Nanoimprint lithography, Critical dimension metrology

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Proceedings Article | 20 October 2006 Paper

Paper

Study of the beam blur and its effect on the future mask fabrication

Sanghee Lee, Sungho Park, Mihye Ahn, Jonggul Doh, Sungyoon Kim, Byunggook Kim, Seongwoon Choi, Woosung Han

Proceedings Volume 6349, 63490X (2006) https://doi.org/10.1117/12.686472

KEYWORDS: SRAF, Scattering, Electron beams, Mask making, Photomasks, Laser scattering, Critical dimension metrology, Monte Carlo methods, Electron beam lithography, Diffusion

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Proceedings Article | 20 October 2006 Paper

Paper

Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film

Jaehyuck Choi, Seungyeon Lee, Eunjung Kim, Il-woo Nam, Byung-Cheol Cha, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6349, 63491I (2006) https://doi.org/10.1117/12.685774

KEYWORDS: Pellicles, Air contamination, Chemical analysis, Photomasks, Fluorine, Quartz, Carbon monoxide, Semiconducting wafers, Environmental monitoring, Gas lasers

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Proceedings Article | 20 October 2006 Paper

Paper

Required mask specification for mass production devices below 65-nm design node

Dongseok Nam, Soohan Choi, Jonggul Doh, Young-hwa Noh, Hojune Lee, Yu-jeung Sin, Bo-hye Kim, Man-kyu Kang, Byunggook Kim, Seong-woon Choi, Woosung Han

Proceedings Volume 6349, 634928 (2006) https://doi.org/10.1117/12.686534

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Photoresist processing, Optical proximity correction, Mask making, Semiconductors, Manufacturing, Computer simulations

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Proceedings Article | 20 October 2006 Paper

Paper

Feasibility study of mask fabrication in double exposure technology

Jong Gul Doh, Sang Hee Lee, Je Bum Yoon, Doo Youl Lee, Seong Yong Cho, Byung Gook Kim, Seong Woon Choi, Woo Sung Han

Proceedings Volume 6349, 63491U (2006) https://doi.org/10.1117/12.686523

KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Image registration, Thermal effects, Mask making, Reticles, Error analysis, Scanners, Chromium

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Proceedings Article | 20 October 2006 Paper

Paper

Qualitative analysis of haze defects

Jaehyuck Choi, Soowan Koh, Sunghun Ji, Byung-Cheol Cha, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6349, 63492S (2006) https://doi.org/10.1117/12.685733

KEYWORDS: Air contamination, Pellicles, Photomasks, Ions, Fluorine, Scanning probe microscopy, Sodium, Magnesium, Aluminum, Chemical analysis

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Proceedings Article | 20 October 2006 Paper

Paper

The specification of the 45-nm node photomask repair process

Moon Gyu Sung, Sungmin Huh, Byung Cheol Cha, Sungwoon Choi, Woosung Han

Proceedings Volume 6349, 63494H (2006) https://doi.org/10.1117/12.686509

KEYWORDS: Photomasks, Transmittance, Polarization, Critical dimension metrology, Diffractive optical elements, Solids, Etching, Scanning electron microscopy, Semiconducting wafers, Quartz

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Proceedings Article | 20 October 2006 Paper

Paper

EUV mask pattern inspection for memory mask fabrication in 45-nm node and below

Do Young Kim, Seong Yong Cho, Hun Kim, Sung Min Huh, Dong Hoon Chung, Byung Chul Cha, Jung Woo Lee, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Eun Ji Kim, Zhengyu Guo, Ellen Quach, David Gee, Tom Brown, Aditya Dayal

Proceedings Volume 6349, 63492L (2006) https://doi.org/10.1117/12.686488

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, EUV optics, Extreme ultraviolet lithography, Deep ultraviolet, Reticles, Defect detection, Binary data, Current controlled current source

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Proceedings Article | 20 October 2006 Paper

Paper

Load balancing using DP management server for commercial MDP software

Jong-Won Kim, Won-Tai Ki, Sung-Hoon Jang, Ji-Hyun Choi, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6349, 63493X (2006) https://doi.org/10.1117/12.686489

KEYWORDS: Manufacturing, Photomasks, Optical proximity correction, Resolution enhancement technologies, Semiconductors, Electronics, Data centers, Distributed computing, Network architectures, Local area networks

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Proceedings Article | 20 October 2006 Paper

Paper

The study of optical performance for quartz dry etching quality in ArF lithography

Won-Suk Ahn, Hye-Kyung Lee, Young-Ju Park, Hyuk-Joo Kwon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6349, 63490C (2006) https://doi.org/10.1117/12.686839

KEYWORDS: Quartz, Etching, Photomasks, Chromium, Dry etching, Nanoimprint lithography, Resolution enhancement technologies, Critical dimension metrology, Electroluminescence, Lithography

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Proceedings Article | 20 May 2006 Paper

Paper

Novel mask inspection flow for better defect review and analysis

Kwon Lim, Jin Hyung Park, Dong Hoon Chung, Seong Woon Choi, Woo Sung Han, Hideo Takizawa, Kouji Miyazaki

Proceedings Volume 6283, 62830Z (2006) https://doi.org/10.1117/12.681858

KEYWORDS: Inspection, Photomasks, Defect inspection, Defect detection, Mask making, Image processing, Manufacturing, Deep ultraviolet, Telecommunications, Semiconductors

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Proceedings Article | 20 May 2006 Paper

Paper

Mask fabrication results using new laser writing system: Sigma7300

Ho-June Lee, Dong-Suk Nam, Sang-Hee Lee, Hyun-Soo Kim, Jung-Hoon Lee, Hak-Seung Han, Byung-Gook Kim, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, 62831J (2006) https://doi.org/10.1117/12.681744

KEYWORDS: Photomasks, Particles, Inspection, Laser systems engineering, Mask making, SRAF, Printing, Semiconducting wafers, Light sources, Optical simulations

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Proceedings Article | 20 May 2006 Paper

Paper

Reduction of MDP time through the improvement of verification method

Young-Hwa Noh, Sung-Hoon Jang, Won-Tai Ki, Ji-Hyeon Choi, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 6283, 62832N (2006) https://doi.org/10.1117/12.681800

KEYWORDS: Data conversion, Computed tomography, Photomasks, Double patterning technology, Lithography, Resolution enhancement technologies, Semiconductors, Electronics, Data centers, Critical dimension metrology

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Proceedings Article | 20 May 2006 Paper

Paper

Study of higher electron beam energy for the mask production for 30 nm node technology

Sanghee Lee, Sungho Park, Byunggook Kim, Seongwoon Choi, Woosung Han

Proceedings Volume 6283, 628308 (2006) https://doi.org/10.1117/12.681735

KEYWORDS: Vestigial sideband modulation, Electron beams, Photomasks, Electron beam lithography, Critical dimension metrology, Laser scattering, Scattering, Monte Carlo methods, Backscatter, Data modeling

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Proceedings Article | 9 November 2005 Paper

Paper

Analysis of various blur effects on mask CD distortion

Hak-Seung Han, Sang-Hee Lee, Byung-Gook Kim, Seong-Yong Moon, Sung Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59924V (2005) https://doi.org/10.1117/12.632268

KEYWORDS: Backscatter, Scattering, Electron beam lithography, Photomasks, Critical dimension metrology, Electrons, Distortion, Photoresist processing, Laser scattering, Lithography

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Proceedings Article | 9 November 2005 Paper

Paper

Improved modeling of fogging and loading effect correction

Sanghee Lee, Byunggook Kim, Hakseung Han, Dongseok Nam, Seongyong Moon, Seongwoon Choi, Woosung Han

Proceedings Volume 5992, 59924U (2005) https://doi.org/10.1117/12.632078

KEYWORDS: Etching, Critical dimension metrology, Modulation, Dry etching, Photomasks, System on a chip, Backscatter, Data modeling, Electron beams, Electron beam lithography

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Proceedings Article | 8 November 2005 Paper

Paper

How large MEEF is acceptable for the low-k₁ lithography?

Dongseok Nam, Dong-Gun Lee, Byunggook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59922W (2005) https://doi.org/10.1117/12.632066

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Tolerancing, Optical testing, Mask making, Scanning electron microscopy, Lithography, Semiconductors, Data processing

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Proceedings Article | 5 November 2005 Paper

Paper

Optimized distributed computing environment for mask data preparation

Byoung-Sup Ahn, Ju-Mi Bang, Min-Kyu Ji, Sun Kang, Sung-Hoon Jang, Yo-Han Choi, Won-Tai Ki, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 599214 (2005) https://doi.org/10.1117/12.632427

KEYWORDS: Optical proximity correction, Computing systems, Photomasks, Distributed computing, Manufacturing, Resolution enhancement technologies, Databases, Data conversion, Data storage, Silver

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Proceedings Article | 5 November 2005 Paper

Paper

Reduction of MDP complexity through the application of OASIS based data flow

Sung-Hoon Jang, Ji-Hyeon Choi, Ji-Soong Park, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 599212 (2005) https://doi.org/10.1117/12.632370

KEYWORDS: Data conversion, Photomasks, Optical proximity correction, Data processing, Inspection, Magnetoencephalography, Databases, Glasses, Semiconducting wafers, Projection systems

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Proceedings Article | 5 November 2005 Paper

Paper

A study of Cr to Mosi in situ dry etching process to reduce plasma induced defect

Il-Yong Jang, Young-Ju Park, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 59920O (2005) https://doi.org/10.1117/12.631951

KEYWORDS: Etching, Chromium, Particles, Plasma, Chlorine, Reactive ion etching, Dry etching, Photomasks, Chemistry, Manufacturing

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Proceedings Article | 4 November 2005 Paper

Paper

The detectability of Qz phase defects and its application for 65nm node CPL mask manufacturing

Won Il Cho, Jin Hyung Park, Dong Hoon Chung, Sung Woon Choi, Woo Sung Han

Proceedings Volume 5992, 599205 (2005) https://doi.org/10.1117/12.632335

KEYWORDS: Inspection, Photomasks, Defect detection, Deep ultraviolet, Manufacturing, Semiconducting wafers, Resolution enhancement technologies, Optics manufacturing, Lithography, Defect inspection

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Proceedings Article | 4 November 2005 Paper

Paper

Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication

Do Young Kim, Won Il Cho, Jin Hyung Park, Dong Hoon Chung, Byung Chul Cha, Seong Woon Choi, Woo Sung Han, Ki Hun Park, Nam Wook Kim, Carl Hess, Weimin Ma, David Kim

Proceedings Volume 5992, 599209 (2005) https://doi.org/10.1117/12.632338

KEYWORDS: Inspection, Defect detection, Photomasks, Contamination, Binary data, Defect inspection, Nanoimprint lithography, Deep ultraviolet, Semiconducting wafers, Mask making

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Proceedings Article | 28 June 2005 Paper

Paper

Process monitoring system for instant defect detection and analysis in 65 nm node photomask fabrications

Young-Seok Cho, Jin-Hyung Park, Won-Il Cho, Jin-Hong Park, Yong-Hyun Kim, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617126

KEYWORDS: Inspection, Photomasks, Image processing, Etching, Defect detection, Signal processing, Particles, Signal detection, Manufacturing, Contamination

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Proceedings Article | 28 June 2005 Paper

Paper

Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Won-Suk Ahn, Hyuk-Joo Kwon, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617227

KEYWORDS: Photomasks, Quartz, Etching, Semiconducting wafers, Fluorine, Dry etching, Chemistry, Wafer-level optics, Lithography, Nanoimprint lithography

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Proceedings Article | 28 June 2005 Paper

Paper

Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Won-Tai Ki, Byung-Sup Ahn, Ji-Soong Park, Seung-Woon Choi, Sang-Back Ma, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617091

KEYWORDS: Photomasks, Chromium, Electron beam lithography, Double patterning technology, Computer simulations, Roentgenium, Semiconducting wafers, Factor analysis, Error analysis, Beam shaping

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Proceedings Article | 28 June 2005 Paper

Paper

Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

Sook-Kyeong Kim, Byung-Gook Kim, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617092

KEYWORDS: Raster graphics, Control systems, Etching, Photomasks, Photoresist processing, Manufacturing, Chemically amplified resists, Vestigial sideband modulation, Modulation, Beam shaping

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Proceedings Article | 28 June 2005 Paper

Paper

The application of phase grating to CLM technology for the sub-65nm node optical lithography

Gi-Sung Yoon, Sung-Hyuck Kim, Ji-Soong Park, Sun-Young Choi, Chan-Uk Jeon, In-Kyun Shin, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617201

KEYWORDS: Photomasks, Optical lithography, Camera shutters, Semiconducting wafers, Optical proximity correction, Manufacturing, Chromium, Nanoimprint lithography, Lithography, Wafer-level optics

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Proceedings Article | 10 May 2005 Paper

Paper

Repair simulation with image processing and artificial intelligence

Yo-Han Choi, Moon-Kyu Sung, Sang-Hyun Lee, Ji-Hyung Lee, Jin-Hong Park, Ji-Hyun Choi, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599369

KEYWORDS: Neural networks, Neurons, Optical simulations, Image segmentation, Quartz, Edge detection, Artificial intelligence, Photomasks, Inspection, Image processing

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Proceedings Article | 27 January 2005 Paper

Paper

The study on causes and control methods of haze contamination

Sung-Jae Han, Bo-Hye Kim, Jin-Hong Park, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576605

KEYWORDS: Air contamination, Photomasks, Contamination, Ions, Manufacturing, Carbon, Sulfur, Lithography, Inspection, Optical lithography

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Proceedings Article | 6 December 2004 Paper

Paper

Quantitative analysis of develop loading effect and its application

Hak-Seung Han, Se-Gun Moon, Je-Bum Yoon, Byung-Gook Kim, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569199

KEYWORDS: Fluctuations and noise, Critical dimension metrology, Photomasks, Photoresist processing, Quantitative analysis, Chemical analysis, Tolerancing, Electron beam lithography, Data conversion, Semiconductors

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Proceedings Article | 20 August 2004 Paper

Paper

New approach for quartz dry etching using hardmask for sub-90-nm photomask technology

Sungmin Huh, Ki-Sung Yoon, Il-Yong Jang, Jung-Hyun Hwang, In-Kyun Shin, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557675

KEYWORDS: Quartz, Etching, Photomasks, Dry etching, Chromium, Diffractive optical elements, Polymers, Resolution enhancement technologies, Phase shifts, Ions

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Proceedings Article | 20 August 2004 Paper

Paper

Analysis of mask CD error by dose modulation for fogging effect

Hojune Lee, Seung-Hune Yang, Byung-Gook Kim, Sung-Yong Moon, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557713

KEYWORDS: Photomasks, Error analysis, Critical dimension metrology, Electron beams, Modulation, Monte Carlo methods, Optical testing, Optical simulations, Systems modeling, Laser scattering

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Proceedings Article | 20 August 2004 Paper

Paper

Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system

Sung-Hoon Jang, Seung-Hune Yang, Byoung-Sup Ahn, Won-Tai Ki, Ji-Hyeon Choi, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557757

KEYWORDS: Photomasks, Critical dimension metrology, Modulation, Vestigial sideband modulation, Error analysis, Optical simulations, Electron beam lithography, Electron beams, Beam shaping, Data modeling

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Proceedings Article | 28 May 2004 Paper

Paper

Study of Cr patch validity for ArF CPL mask and its fabrication

Chang-Hwan Kim, Sung-Hyuk Kim, Myoung-Soo Lee, Ji-Soong Park, In-Gyun Shin, Sung-Woon Choi, Hee-Sun Yoon, Woo-Sung Han

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535976

KEYWORDS: Chromium, Photomasks, Resolution enhancement technologies, Optical alignment, Laser processing, Semiconducting wafers, Phase shifts, Lithography, Logic devices, Control systems

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Proceedings Article | 17 December 2003 Paper

Paper

Dose-modulation-induced mask CD error on simultaneous correction of fogging and loading effect

Hojune Lee, Seung-Hune Yang, Jin-Hong Park, Seong-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518283

KEYWORDS: Monte Carlo methods, Modulation, Etching, Critical dimension metrology, Photomasks, Scattering, Dry etching, Lithography, Cadmium, Error analysis

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Proceedings Article | 17 December 2003 Paper

Paper

Research on the origin of particle generation in ICP plasma reactor

Jeong-Yoon Lee, Nam-Kyu Kim, Il-Yong Jang, Sung-Yong Mun, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517957

KEYWORDS: Particles, Plasma, Chemistry, Plasma etching, Etching, Polymers, Ions, Photomasks, Aluminum, Critical dimension metrology

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Proceedings Article | 17 December 2003 Paper

Paper

Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator

Mi-Young Kim, Won-Tai Ki, Sung-Hoon Lee, Ji-Hyeon Choi, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518028

KEYWORDS: Monte Carlo methods, Critical dimension metrology, Electron beam lithography, Photomasks, Modulation, Scattering, Error analysis, Vestigial sideband modulation, Cadmium, Chemically amplified resists

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Proceedings Article | 17 December 2003 Paper

Paper

Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography

Ji-Soong Park, Sung-Hyuck Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn, Jae-Han Lee, Hye-soo Shin, Thomas Laidig, Douglas Van Den Broeke, J. Fung Chen

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518014

KEYWORDS: Photomasks, Scattering, Semiconducting wafers, Neodymium, Lithography, Optical proximity correction, Camera shutters, Optics manufacturing, Wafer-level optics, Phase shifting

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Proceedings Article | 17 December 2003 Paper

Paper

New method for approaching the loading-free process for photomask Cr etching

Il-Yong Jang, Jeong-Yun Lee, Sung-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517842

KEYWORDS: Etching, Chromium, Photomasks, Oxygen, Dry etching, Chlorine, Critical dimension metrology, Manufacturing, Mask making, Scanning electron microscopy

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Proceedings Article | 28 August 2003 Paper

Paper

Phase defect printability analysis for chromeless phase lithography technology

Sungmin Huh, JoHyung Park, Dong-Hoon Chung, Chang-Hwan Kim, In-Kyun Shin, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504395

KEYWORDS: Photomasks, Inspection, Quartz, Dry etching, Finite-difference time-domain method, Lithography, Defect inspection, Semiconducting wafers, Mask making, Defect detection

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Proceedings Article | 28 August 2003 Paper

Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504055

KEYWORDS: Particles, Inspection, Dry etching, Photomasks, Reticles, Manufacturing, Critical dimension metrology, Scanning electron microscopy, Etching, Chromium

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Proceedings Article | 28 August 2003 Paper

Paper

Developement of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM

Il-Yong Jang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504196

KEYWORDS: Etching, Photomasks, Quartz, Manufacturing, Ions, Plasma, Dry etching, Resolution enhancement technologies, Chromium, Integrated circuits

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Proceedings Article | 26 June 2003 Paper

Paper

Flare-induced CD variation correction using transmittance controlled mask

Dong-Seok Nam, Gi-Sung Yeo, Jong Rak Park, Sung-Woon Choi, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485409

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Transmittance, Contamination, Cadmium, Control systems, Quartz, Optical lithography, Semiconductors

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Proceedings Article | 26 June 2003 Paper

Paper

Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Jong Rak Park, Soon Ho Kim, Gi-Sung Yeo, Sung-Woon Choi, Won-Tai Ki, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485391

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Scanners, Transmittance, Optical lithography, Coating, Etching, Photoresist processing, Optical filters

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Proceedings Article | 26 June 2003 Paper

Paper

Feasibility evaluations of alternating phase-shift mask for imaging sub-80-nm feature with KrF

Myung-Ah Kang, Sung-Hyuck Kim, In-Kyun Shin, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485430

KEYWORDS: Chromium, Photomasks, Optical proximity correction, Lithography, Lithographic illumination, Critical dimension metrology, Manufacturing, Phase shifts, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 26 June 2003 Paper

Paper

Fast topography simulation using differential method

Sonny Zinn, Sung-Hyuck Kim, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485355

KEYWORDS: Finite-difference time-domain method, Computer simulations, Photomasks, Maxwell's equations, Printing, Quartz, Binary data, Etching, Interfaces, Refractive index

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Proceedings Article | 26 June 2003 Paper

Paper

Comparison of vector theories for aerial image calculation

Byoung Sup Ahn, Sonny Zinn, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485354

KEYWORDS: Mathematical modeling, Polarization, Diffraction, Radio propagation, Optical lithography, Systems modeling, Light wave propagation, Optical simulations, Electromagnetic radiation, Fourier optics

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Proceedings Article | 27 December 2002 Paper

Paper

Application of Cr-less mask technology for sub-100-nm gate with single exposure

Sung-Hyuck Kim, Dong-Hoon Chung, Ji-Soong Park, In-Kyun Shin, Seong-woon Choi, Jung-Min Sohn, Jae-Han Lee, Hye-Soo Shin, J. Fung Chen, Douglas Van Den Broeke

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468097

KEYWORDS: Photomasks, Camera shutters, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Chromium, Lithography, Wafer-level optics, Phase shifts, Printing

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Proceedings Article | 27 December 2002 Paper

Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks

Jong Rak Park, Soon Ho Kim, Hojune Lee, Il-Yong Jang, Yo-Han Choi, Seung-Hune Yang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092

KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

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Proceedings Article | 27 December 2002 Paper

Paper

Manufacturability evaluation of model-based OPC masks

Sung-Hoon Jang, Sonny Zinn, Won-Tai Ki, Ji-Hyun Choi, Chan-Uk Jeon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, Yong-Ho Oh, Jai-Cheol Lee, Sungwoo Lim

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468093

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Manufacturing, Model-based design, Vestigial sideband modulation, Optical lithography, Semiconducting wafers, Data conversion, Computer simulations

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Proceedings Article | 27 December 2002 Paper

Paper

Fogging effect consideration in mask process at 50-KeV e-beam systems

Seung-Hune Yang, Yo-Han Choi, Jong-Rak Park, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468100

KEYWORDS: Gaussian beams, Modulation, Vestigial sideband modulation, Critical dimension metrology, Beam shaping, Raster graphics, Electron beams, Photomasks, Mask making, Electrons

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Proceedings Article | 27 December 2002 Paper

Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Seong-Yong Moon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468096

KEYWORDS: Particles, Inspection, Photomasks, Reticles, Dry etching, Manufacturing, Defect inspection, Scanning electron microscopy, Atomic force microscopy, Quartz

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Proceedings Article | 27 December 2002 Paper

Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

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Proceedings Article | 1 August 2002 Paper

Paper

Development of mask-making process for CLM manufacturing technology

Jin-Hyung Park, Dong-Hoon Chung, Man-Ki Lee, In-Kyun Shin, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, J. Fung Chen, Douglas Van Den Broeke

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476959

KEYWORDS: Photomasks, Quartz, Etching, Inspection, Manufacturing, Dry etching, Binary data, Resolution enhancement technologies, Optics manufacturing, Lithography

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Proceedings Article | 30 July 2002 Paper

Paper

Measurement of the flare and in-field linewidth variation due to the flare

Tae Moon Jeong, Seong-Woon Choi, Sang-Gyun Woo, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474531

KEYWORDS: Photomasks, Optical components, Image enhancement, Semiconducting wafers, Light scattering, Image processing, Optical lithography, Scattering, Microelectronics, Contamination

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Proceedings Article | 30 July 2002 Paper

Paper

New resolution enhancement technology for manufacturing sub-100-nm technology

Dong-Hoon Chung, Jean-Young Park, Man-Ki Lee, In-Gyun Shin, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, J. Fung Chen, Douglas Van Den Broeke

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474534

KEYWORDS: Etching, Photomasks, Quartz, Inspection, Dry etching, Resolution enhancement technologies, Manufacturing, Mask making, Optical lithography, Lithography

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Proceedings Article | 16 July 2002 Paper

Paper

Proximity effect correction optimization considering fogging and loading effects compensation

Seung-Hune Yang, Yo-Han Choi, Jong Park, Yong-Hoon Kim, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473426

KEYWORDS: Critical dimension metrology, Etching, Beam shaping, Mask making, Backscatter, Scattering, Cadmium, Electron beam lithography, Modulation, Photomasks

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Proceedings Article | 11 March 2002 Paper

Paper

Extended capability of laser writer for masks beyond 180-nm nodes

Sung-Yong Cho, Jeong-Yun Lee, Chang-Hwan Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458290

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Scanning electron microscopy, Scattering, Standards development, Phase shifts, Semiconducting wafers, Printing, Optics manufacturing

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Proceedings Article | 11 March 2002 Paper

Paper

Optical performances under the conditions of various geometrical structures and phase defects in phase edge PSM

Tae Moon Jeong, In-Gyun Shin, Dong-Hoon Chung, Sung-Hyuck Kim, Hyoungdo Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458361

KEYWORDS: Critical dimension metrology, Photomasks, Etching, Phase shifts, Optical lithography, Chromium, Manufacturing, Optics manufacturing, Semiconducting wafers, Wet etching

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Proceedings Article | 11 March 2002 Paper

Paper

Analysis of dry etch loading effect in mask fabrication

Jeong-Yun Lee, Sung-Yong Cho, Chang-Hwan Kim, Sung-Woo Lee, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458341

KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

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Proceedings Article | 14 September 2001 Paper

Paper

Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Sung-Woo Lee, Dong-Hoon Chung, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435775

KEYWORDS: Cadmium, Photomasks, Optical lithography, Tolerancing, Lithography, Phase shifts, Resolution enhancement technologies, Phase measurement, Quartz, Etching

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Proceedings Article | 14 September 2001 Paper

Paper

Mask considerations for manufacturing assist features

Ji-Hyeon Choi, Won-Il Cho, Byeongsoo Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435681

KEYWORDS: Photomasks, Inspection, Optical proximity correction, Manufacturing, Critical dimension metrology, Semiconducting wafers, Transmittance, Defect detection, Phase shifts, Mask making

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Proceedings Article | 5 September 2001 Paper

Paper

Prediction of MEEF using a simple model and MEEF enhancement parameters

Dong-Hoon Chung, Seung-Hune Yang, Hyung-Do Kim, In-Gyun Shin, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438343

KEYWORDS: Photomasks, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Optical lithography, Image enhancement, Image processing, Diffusion, Semiconductors, Mask making

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Proceedings Article | 5 September 2001 Paper

Paper

Resolution improvement of chemical-amplification resist using process-induced effect correction

Ji-Hyeon Choi, Chang-Hwan Kim, Jeong-Yun Lee, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438359

KEYWORDS: Etching, Dry etching, Critical dimension metrology, Photoresist processing, Chromium, Data modeling, Photomasks, Instrument modeling, Scattering, Diffusion

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Proceedings Article | 5 September 2001 Paper

Paper

Application of multistep quartz etching method to strong PSMs

Hyoungdo Kim, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438334

KEYWORDS: Etching, Quartz, Dry etching, Photomasks, Wet etching, Phase shifting, Polymers, Resolution enhancement technologies, Gases, Semiconductors

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Proceedings Article | 5 September 2001 Paper

Paper

Application of chemically amplified resist to 10-keV e-beam system

Sung-Hee Ahn, Chang-Hwan Kim, Seung-Hune Yang, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438348

KEYWORDS: Chromium, Chemically amplified resists, Scattering, Fluctuations and noise, Photomasks, Mask making, Etching, Electron beam lithography, Lithography, Scanning electron microscopy

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Proceedings Article | 20 August 2001 Paper

Paper

Vacuum delay effect of CAR in mask fabrication

Chang-Hwan Kim, Chan-Uk Jeon, Sung-Jae Han, Won-Il Cho, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436658

KEYWORDS: Critical dimension metrology, Mask making, Photoresist processing, Photomasks, Chromium, Diffusion, Optical proximity correction, Ions, Chemistry, Projection systems

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Proceedings Article | 9 April 2001 Paper

Paper

Doubly exposed patterning characteristics using two alternating phase-shift masks

Sung-Woo Lee, In-Gyun Shin, Yonghoon Kim, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425100

KEYWORDS: Photomasks, Optical lithography, Tolerancing, Lithography, Phase shifts, Cadmium, Resolution enhancement technologies, Critical dimension metrology, Manufacturing, Optical alignment

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Proceedings Article | 9 April 2001 Paper

Paper

Application of e-beam chemically amplified resist to devices below 0.18-um node

Chan-Uk Jeon, Chang-Hwan Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425090

KEYWORDS: Photomasks, Photoresist processing, Mask making, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Chemically amplified resists, Scattering, Vestigial sideband modulation, Diffusion

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Proceedings Article | 22 January 2001 Paper

Paper

Effect of beam blur in mask fabrication

Seung-Hune Yang, Won-Tai Ki, Seong-Yong Moon, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410725

KEYWORDS: Beam shaping, Critical dimension metrology, Electron beams, Photoresist processing, Scanning electron microscopy, Optical simulations, Beam analyzers, Mask making, Convolution, Monte Carlo methods

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Proceedings Article | 22 January 2001 Paper

Paper

Analysis of photomask distortion caused by blank materials and open ratios

Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Tae Moon Jeong, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410697

KEYWORDS: Photomasks, Chromium, Distortion, Semiconducting wafers, Error analysis, Lithography, Scanners, Printing, Overlay metrology, Dry etching

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Proceedings Article | 22 January 2001 Paper

Paper

Effect of mask reduction ratio in alternating phase-shift masks

In-Gyun Shin, Sung-Ho Lee, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn, Tong-Kun Lim

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410707

KEYWORDS: Photomasks, Tolerancing, Phase shifts, Scattering, Quartz, Chromium, Optical lithography, Manufacturing, Image analysis, Solids

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Proceedings Article | 22 January 2001 Paper

Paper

Experimental study on the possibility of chemically amplified resists for mask production for device generations < 180 nm

Chang-Hwan Kim, Chan-Uk Jeon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410764

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Chemically amplified resists, Mask making, Photoresist processing, Scattering, Diffusion, Scanning electron microscopy, Contamination

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Proceedings Article | 19 July 2000 Paper

Paper

Comparative study on MEEF and dose latitude between attenuated PSM and Cr binary masks

Hyun Cho, Yong-Hoon Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392034

KEYWORDS: Photomasks, Binary data, Chromium, Semiconducting wafers, Optical lithography, Phase shifts, Transmittance, Lithography, Optical resolution, Wafer-level optics

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Proceedings Article | 19 July 2000 Paper

Paper

Dose latitude dependency on resist contrast in e-beam mask lithography

Byung-Cheol Cha, Seong-Yong Moon, Won-Tai Ki, Seung-Hune Yang, Seong-Woon Choi, Woo-Sung Han, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392058

KEYWORDS: Photoresist processing, Photomasks, Etching, Electron beam lithography, Beam shaping, Critical dimension metrology, Lithography, Dry etching, Gaussian beams, Scattering

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Proceedings Article | 30 December 1999 Paper

Paper

Analysis of photomask CD errors depending on development methods

Seong-Yong Moon, Won-Tai Ki, Byung-Cheol Cha, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373352

KEYWORDS: Critical dimension metrology, Photomasks, Error analysis, Liquids, Optical lithography, Coating, Semiconductors, Electronics, Lithography, Scattering

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Proceedings Article | 30 December 1999 Paper

Paper

Evaluation of lens aberrations depending on the transmittance of DUV-attenuated PSM

JoHyun Park, Yong-Hoon Kim, Sung-Chul Lim, Kyung Lee, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373385

KEYWORDS: Monochromatic aberrations, Critical dimension metrology, Transmittance, Binary data, Photomasks, Lithography, Phase shifts, Projection systems, Phase compensation, Tolerancing

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Proceedings Article | 25 August 1999 Paper

Paper

Impact of mask CD error on wafer CD error at low-k1 photolithography

Byung Kim, Seong-Woon Choi, Ji-Hyun Choi, Chan-Uk Chun, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360250

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Optical lithography, Lithography, Phase shifts, Deep ultraviolet, Manufacturing, Control systems, Logic devices

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Proceedings Article | 25 August 1999 Paper

Paper

Evaluation of the attenuated PSM performance as the shifter transmittance and illumination systems

Yong-Hoon Kim, JoHyun Park, Jin-Hong Park, Kyung Lee, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360214

KEYWORDS: Transmittance, Lithography, Photomasks, Deep ultraviolet, Lithographic illumination, Semiconducting wafers, Critical dimension metrology, Resolution enhancement technologies, Binary data, Optical proximity correction

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Proceedings Article | 18 December 1998 Paper

Paper

Evaluation of the practical use of GHOST technique for various e-beam resists

Byung-Cheol Cha, Jin-Min Kim, Byung Kim, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332834

KEYWORDS: Critical dimension metrology, Mask making, Scattering, Photomasks, Electron beam lithography, Electron beams, Modulation transfer functions, Laser scattering, Beam shaping, Raster graphics

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Proceedings Article | 1 September 1998 Paper

Paper

Parameters affecting megasonic power transmittance in the megasonic cleaning process

Yong-Hoon Kim, Jin-Hong Park, Keumhee Lee, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328852

KEYWORDS: Wave plates, Liquids, Transmittance, Particles, Photomasks, Wave propagation, Semiconducting wafers, Transducers, Ultrasonics, Temperature metrology

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Proceedings Article | 29 June 1998 Paper

Paper

Lithography of 180-nm design rule for 1-Gb DRAM

Dongseok Nam, Junghyun Lee, Chang-Hwan Kim, Seong-Woon Choi, Hoyoung Kang, Joo-Tae Moon

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310727

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, 193nm lithography, Photoresist processing, Photoresist developing, Monochromatic aberrations, Optical lithography, Control systems, Photoresist materials

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Proceedings Article | 28 July 1997 Paper

Paper

CD variation sources of photomask

Byung Kim, Seong-Woon Choi, Yong Yu, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277271

KEYWORDS: Critical dimension metrology, Photomasks, Error analysis, Polymers, Sputter deposition, Quartz, Scattering, Semiconducting wafers, Analytical research, Statistical methods

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Proceedings Article | 12 February 1997 Paper

Paper

Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation

Byung-Cheol Cha, Yoo-Hyon Kim, Seong-Woon Choi, Yong Yu, Jung-Min Sohn

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301198

KEYWORDS: Beam shaping, Monte Carlo methods, Photoresist processing, Photomasks, Electron beam lithography, Computer simulations, Optical simulations, Algorithm development, Scattering, Lithography

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Proceedings Article | 12 February 1997 Paper

Paper

Current status of mask CD uniformity as related to e-beam system

Sung-Chul Lim, Byung Kim, Seong-Woon Choi, Kyung Lee, Hyun Cho, Yong Yu, Hanku Cho, Jung-Min Sohn

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301202

KEYWORDS: Critical dimension metrology, Photomasks, Optical lithography, Raster graphics, Error analysis, Manufacturing, Semiconducting wafers, X-ray lithography, Cadmium, Printing

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Proceedings Article | 27 December 1996 Paper

Paper

Correction method for radial effect caused by spin process

Jin-Min Kim, Seong-Woon Choi, Byung-Cheol Cha, Hee-Sun Yun, Jung-Min Sohn

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262833

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Reticles, Manufacturing, Optical lithography, Semiconductors, Electronics, Lithography, Etching

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Proceedings Article | 24 July 1996 Paper

Paper

Mask technology for 0.18-um device generation

Jung-Min Sohn, Seong-Woon Choi, Byung Kim, Hanku Cho, Hee-Sun Yoon

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245234

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Semiconducting wafers, Optical lithography, Manufacturing, Reticles, Silicon, Inspection, Deep ultraviolet

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Proceedings Article | 24 July 1996 Paper

Paper

Resolution enhancement with thin Cr for chrome mask making

Byung-Cheol Cha, Seong-Woon Choi, Jin-Min Kim, Hanku Cho, Jung-Min Sohn

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245205

KEYWORDS: Critical dimension metrology, Chromium, Etching, Wet etching, Photomasks, Dry etching, Resolution enhancement technologies, Mask making, Electron beam lithography, Anisotropic etching

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Proceedings Article | 15 February 1994 Paper

Paper

New simple method of extending the limit of rim phase-shift mask

Seong-Woon Choi, Sang-Gyun Woo, Jin-Min Kim, Jongmin Son, Jeong Lee

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167279

KEYWORDS: Photomasks, Chemical species, Phase shifts, Resolution enhancement technologies, Lithographic illumination, Time multiplexed optical shutter, Semiconducting wafers, Optical lithography, Information operations, Electronics

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Showing 5 of 117 publications

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